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- [[Category:Soft Lithography]] | Instrument_Type = Lithography4 KB (580 words) - 19:18, 7 March 2025
- [[Category:Soft Lithography]] | Instrument_Type = Soft Lithography1 KB (135 words) - 16:26, 12 March 2024
- '' '''PVD-07''' is listed under Soft Lithography'' <br> '' '''PVD-08''' is listed under Soft Lithography''6 KB (840 words) - 15:04, 31 January 2025
- |AreasResponsibility = Soft Lithography, <br> New Users ...phy manager, he provides complete user training in the fabrication of soft lithography and microfluidic devices. This includes mask design, proper spin coating t702 bytes (86 words) - 12:30, 25 October 2022
- [[Category:Lithography]] | Instrument_Type = Lithography4 KB (516 words) - 17:56, 27 February 2025
- ...d to measure the etch rate of PECVD SiNx using an Oxford 80 plus RIE tool. Lithography equipment and material used in this study can be substituted by others that === Soft Bake ===2 KB (255 words) - 15:47, 16 September 2024
- = Lithography = = Soft Lithography =2 KB (249 words) - 16:09, 14 January 2025
- | Elionix ELS-7500EX E-Beam Lithography System || EBL-01 || Lithography || [[David_Barth | David Barth]] | Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David Barth]]7 KB (864 words) - 14:10, 31 March 2025
- |AreasResponsibility = Operations <br> Soft Lithography <br> New Users |AreasResponsibility = Lithography <br> Advanced Processing2 KB (261 words) - 10:00, 10 May 2024
- ...rf1a8wvc HARE SQ 2] || negative,<br> 2um-5um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM ...qxjrd SU-8 3050] || negative,<br> 40um-100um || i-line & broadband || Soft Lithography, Epoxy, Insulator || [[SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01]], [[ABM15 KB (2,353 words) - 12:20, 3 March 2025
- [[Category:Soft Lithography]] | Instrument_Type = Soft Lithography1 KB (175 words) - 16:12, 12 March 2024