Lesker PVD75 E-beam Evaporator

From Quattrone Nanofabrication Facility
Revision as of 09:46, 16 May 2024 by Dsabr (talk | contribs) (→‎SOPs & Troubleshooting)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search


Lesker PVD75 E-Beam/Thermal Evaporator
PVD-04.jpeg
Tool Name Lesker PVD75 E-Beam/Thermal Evaporator
Instrument Type Physical vapor deposition
Staff Manager David Barth
Lab Location Bay 2
Tool Manufacturer Kurt J. Lesker
Tool Model PVD75
NEMO Designation PVD-04
Lab Phone 215-898-9748
SOP Link SOP

Description

The tool

The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd. The tool also comes with a load-lock, allowing for fast and easy transfer of samples in and out of the system. While less flexible than the PVD-02 deposition system in terms of available materials, the PVD-04 is a much faster tool.

Available materials

The tool contains the following materials:

  • Au - Gold
  • Cr - Chromium
  • Pd - Palladium
  • Ti - Titanium

Deposition is limited to thin-film thicknesses of ~100 nm.

Resources

Training video

Link: PVD-4 Training Video

SOPs & Troubleshooting

Link: SOP