W master recipe
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Step T006 is the deposition step.
| Step Number | T000 | T001 | T002 | T003 | T004 | T005 | T006 | T007 | T008 | T009 | T010 | T011 | T012 |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Step Time (sec) | 5 | 30 | 30 | 30 | 30 | 30 | [dep] | 30 | 30 | 30 | 30 | 30 | 300 |
| Min Vacuum Setpoint (Torr) | |||||||||||||
| Gas - (PID or Fixed) | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | ||
| Gas - PID Master Gas Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | ||
| Gas1 - Setpoint (sccm) | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | ||
| Gas2 - Setpoint (sccm) | |||||||||||||
| Gas PID Pressure (mTorr) | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | ||
| RF Source - Sputter (Watts) | |||||||||||||
| RF Source - Cathode Select | |||||||||||||
| RF Source - Shutter | |||||||||||||
| DC 1 Source - Sputter (Watts) | 25 | 50 | 75 | 100 | 125 | 140 | 120 | 100 | 80 | 60 | 25 | ||
| DC 1 Source - Cathode Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | ||
| DC 1 Source - Shutter | Open | ||||||||||||
| DC 2 Source - Sputter (Watts) | |||||||||||||
| DC 2 Source - Shutter | |||||||||||||
| Pressure Control (Throttle) | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | |
| Ignition Pressure (mTorr) | |||||||||||||
| Rotation Speed (0-100%) | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 |
| End Process (Yes) | Yes |