W master recipe

> Click here to return to PVD-05 <

Step T010 is the deposition step.

Step Number	T000	T001	T002	T003	T004	T005	T006	T007	T008	T009	T010	T011	T012
Step Time (sec)	5	60	60	60	60	60	60	60	60	60	[dep]	200	5
Min Vacuum Setpoint (Torr)
Gas - (PID or Fixed)		PID	PID	PID	PID	PID	PID	PID	PID	PID	PID
Gas - PID Master Gas Select		1	1	1	1	1	1	1	1	1	1
Gas1 - Setpoint (sccm)		30	30	30	30	30	30	30	30	30	30
Gas2 - Setpoint (sccm)
Gas PID Pressure (mTorr)		30	25	20	15	12	10	8	6	4	3
RF Source - Sputter (Watts)
RF Source - Cathode Select
RF Source - Shutter
DC 1 Source - Sputter (Watts)		100	100	100	150	200	250	300	350	400	450
DC 1 Source - Cathode Select		1	1	1	1	1	1	1	1	1	1
DC 1 Source - Shutter											Open
DC 2 Source - Sputter (Watts)
DC 2 Source - Shutter
Pressure Control (Throttle)	Yes	Yes	Yes	Yes	Yes	Yes	Yes	Yes	Yes	Yes	Yes
Ignition Pressure (mTorr)
Rotation Speed (0-100%)	50	50	50	50	50	50	50	50	50	50	50	50
End Process (Yes)													Yes