Photolithography
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- How to Make a Mask
- Resists at QNF
- Developers at QNF -- Under Construction
- Ancillary Process Chemicals at QNF -- Under Construction
- KemLab Resist Presentation
Internal Reports
- Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography LW-01, SPR 220-3
- Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813
- Influence of flow rate, nozzle speed, pitch and the number of passes on the thickness of S1805 photoresist in SUSS MicroTec AS8 spray coater RC-01, S1805
- MicroChem S1818 Contrast Curve Optimization MA-01
- Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer
- Surface Treatment and Adhesion Study
- Heidelberg DWL66+ S1805 Contrast Curves
- Heidelberg DWL66+ S1813 Contrast Curves
- MicroChem S1800 Series Resist Application onto Si