Photolithography

THIS PAGE IS UNDER CONSTRUCTION

• How to Make a Mask
• Resists at QNF
• Developers at QNF -- Under Construction
• Ancillary Process Chemicals at QNF -- Under Construction
• KemLab Resist Presentation

Internal Reports

• Effect of Developer Temperature on Photoresist Contrast in Grayscale Lithography LW-01, SPR 220-3
• Optimization of Bilayer Lift-Off Process to Enable the Gap Size of 1μm Using LOR 3A and S1813
• Influence of flow rate, nozzle speed, pitch and the number of passes on the thickness of S1805 photoresist in SUSS MicroTec AS8 spray coater RC-01, S1805
• MicroChem S1818 Contrast Curve Optimization MA-01
• Correction of pattern size deviations in the fabrication of photomasks made with a laser direct-writer
• Surface Treatment and Adhesion Study
• Heidelberg DWL66+ S1805 Contrast Curves
• Heidelberg DWL66+ S1813 Contrast Curves
• MicroChem S1800 Series Resist Application onto Si

External Resources

• Chris A. Mack (Lithoguru) - Photolithography

• EPFL
  • Introduction to Photolithography

• MicroChemicals
  • Softbake
  • Rehydration
  • Development
  • Troubleshooting

• IMM Technical Resources
  • Lithography Process Overview
  • Effect of Ambient Humidity on Photoresists
• Kemlab - Photolithography Glossary