EVG 510 Wafer Bonder

From Quattrone Nanofabrication Facility
Revision as of 13:22, 3 January 2024 by Coana (talk | contribs) (update to NEMO)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search


EVG 510 Wafer Bonder
BE-01.jpeg
Tool Name EVG 510 Wafer Bonder
Instrument Type Back End
Staff Manager Eric Johnston
Lab Location Bay 4
Tool Manufacturer EV Group
Tool Model 510
NEMO Designation BE-01
Lab Phone XXXXX
SOP Link SOP

Description

The EVG510 Wafer Bonding System is a highly flexible R&D system that can handle small substrate pieces up to 100 mm wafers. The new tool supports a variety of bonding processes, such as anodic, eutectic, diffusion, fusion, solder, and adhesive bonds, as well as other thermal processes, including oxide removal and high temperature bakes under a controlled atmosphere. The system also offers quick re-tooling with a conversion time of less than five minutes, making it ideal for universities and R&D as well as small-volume production applications.

Specification Maximum contact force: 10 kN Maximum temperature: 550 ºC Vacuum: ~0.1 mbar Power supply for anodic bonding: 0-2000 V and 50 mA


Applications
  • Anodic wafer bonding
  • Eutectic wafer bonding
  • Diffusion wafer bonding
  • Fusion wafer bonding
  • Adhesive wafer bonding


Resources

SOPs & Troubleshooting