W master recipe
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> Click here to return to PVD-05 <
Step T010 is the deposition step.
| Step Number | T000 | T001 | T002 | T003 | T004 | T005 | T006 | T007 | T008 | T009 | T010 | T011 | T012 |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Step Time (sec) | 5 | 60 | 60 | 60 | 60 | 60 | 60 | 60 | 60 | 60 | [dep] | 200 | 5 |
| Min Vacuum Setpoint (Torr) | |||||||||||||
| Gas - (PID or Fixed) | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | |||
| Gas - PID Master Gas Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
| Gas1 - Setpoint (sccm) | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | 30 | |||
| Gas2 - Setpoint (sccm) | |||||||||||||
| Gas PID Pressure (mTorr) | 30 | 25 | 20 | 15 | 12 | 10 | 8 | 6 | 4 | 3 | |||
| RF Source - Sputter (Watts) | |||||||||||||
| RF Source - Cathode Select | |||||||||||||
| RF Source - Shutter | |||||||||||||
| DC 1 Source - Sputter (Watts) | 100 | 100 | 100 | 150 | 200 | 250 | 300 | 350 | 400 | 450 | |||
| DC 1 Source - Cathode Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
| DC 1 Source - Shutter | Open | ||||||||||||
| DC 2 Source - Sputter (Watts) | |||||||||||||
| DC 2 Source - Shutter | |||||||||||||
| Pressure Control (Throttle) | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | ||
| Ignition Pressure (mTorr) | |||||||||||||
| Rotation Speed (0-100%) | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | |
| End Process (Yes) | Yes |