Titanium is a transition metal with atomic number 22 and symbol Ti. Titanium has a low density, high strength and is resistant to corrosion by water. It has relatively poor electrical and thermal conduction compared to most metals.
Equipment
Deposition Equipment
Etching
Applications
Processes
Sputter Deposition Rates
PVD Tool
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Cathode 2 (DC; high mag)
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Recorded
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Cathode 3 (DC)
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Recorded
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Cathode 4 (DC; high mag)
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Recorded
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Pressure |
Power |
Rate |
Pressure |
Power |
Rate |
Pressure |
Power |
Rate
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PVD-03 |
6 mTorr |
300 W |
1.8 Å s-1 |
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5 mTorr |
300 W |
0.98 Å s-1 |
03/06/23 |
6 mTorr |
300 W |
0.8 Å s-1 |
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PVD Tool
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Cathode 2 (DC)
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Recorded
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Pressure |
Power |
Rate
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PVD-05 |
3 mTorr |
350 W |
2.0 Å s-1
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PVD-05 Master Recipe:
Step T004 is the deposition step and step T005 is the cool-down step (60 s).
Step Number |
T000 |
T001 |
T002 |
T003 |
T004 |
T005 |
T006
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Step Time (sec) |
5 |
120 |
60 |
60 |
[dep] |
60 |
5
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Min Vacuum Setpoint (Torr) |
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Gas - (PID or Fixed) |
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PID |
PID |
PID |
PID |
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Gas - PID Master Gas Select |
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1 |
1 |
1 |
1 |
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Gas1 - Setpoint (sccm) |
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10 |
10 |
10 |
10 |
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Gas2 - Setpoint (sccm) |
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Gas PID Pressure (mTorr) |
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10 |
5 |
3 |
3 |
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RF Source - Sputter (Watts) |
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RF Source - Cathode Select |
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RF Source - Shutter |
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DC 1 Source - Sputter (Watts) |
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100 |
200 |
300 |
350 |
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DC 1 Source - Cathode Select |
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2 |
2 |
2 |
2 |
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DC 1 Source - Shutter |
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Open |
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DC 2 Source - Sputter (Watts) |
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DC 2 Source - Shutter |
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Pressure Control (Throttle) |
Yes |
Yes |
Yes |
Yes |
Yes |
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Ignition Pressure (mTorr) |
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Rotation Speed (0-100%) |
50 |
50 |
50 |
50 |
50 |
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End Process (Yes) |
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Yes
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