Difference between revisions of "Oxford Cobra ICP Etcher"
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== Description == | == Description == | ||
Oxford PlasmaPro 100 is an inductively coupled plasma (ICP) etcher. The tool uses an RF magnetic field to induce an RF electric field and energize the electrons that result in the ionization of gas molecules and atoms at low pressures. | Oxford PlasmaPro 100 is an inductively coupled plasma (ICP) etcher. The tool uses an RF magnetic field to induce an RF electric field and energize the electrons that result in the ionization of gas molecules and atoms at low pressures. | ||
| − | Max ICP power: 3 kW | + | * Max ICP power: 3 kW |
| − | + | * Max RF power: 200 W | |
The tool is connected to the following gases: | The tool is connected to the following gases: | ||
Revision as of 08:42, 15 March 2023
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| Tool Name | Oxford Cobra ICP Etcher |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | Oxford Instruments |
| Tool Model | Cobra PlasmaPro 100 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
Oxford PlasmaPro 100 is an inductively coupled plasma (ICP) etcher. The tool uses an RF magnetic field to induce an RF electric field and energize the electrons that result in the ionization of gas molecules and atoms at low pressures.
- Max ICP power: 3 kW
- Max RF power: 200 W
The tool is connected to the following gases: BCl3, Cl2, Ar, O2, SF6, CF4, and CHF3.
Applications
- Etch of Si
- Etch of SiO2
- Etch of SiNx
- Etch of InP
- Etch of Al, Cr, Ti, Nb, hafnia, alumina ....
- for a complete list of materials etched in the tool please refer to the SOP at the bottom off this page