Difference between revisions of "Veeco Savannah 200"
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* Aluminum oxide | * Aluminum oxide | ||
* Pd | * Pd | ||
| + | * Under development: Hafnia (using HfCl4 and O3) | ||
== Resources == | == Resources == | ||
Revision as of 13:30, 5 May 2022
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| Tool Name | Creating Veeco Savannah 200 |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | Veeco |
| Tool Model | Savannah 200 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah is capable of holding substrates of different sizes up to 200mm. The Savannah thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines.
Films
- Pt
- Aluminum oxide
- Pd
- Under development: Hafnia (using HfCl4 and O3)