Difference between revisions of "SiO2 (silicon dioxide)"
Jump to navigation
Jump to search
| Line 6: | Line 6: | ||
===Deposition Equipment=== | ===Deposition Equipment=== | ||
| + | * '''ALD-01:'''[[Cambridge Nanotech S200 ALD | Cambridge Nanotech S200 ALD]] | ||
* '''CVD-01:''' [[Oxford PlasmaLab 100 PECVD | Oxford PlasmaLab 100 PECVD]] | * '''CVD-01:''' [[Oxford PlasmaLab 100 PECVD | Oxford PlasmaLab 100 PECVD]] | ||
* '''CVD-02:''' [[Sandvik Furnace Stack | Sandvik Furnace Stack]] | * '''CVD-02:''' [[Sandvik Furnace Stack | Sandvik Furnace Stack]] | ||
Revision as of 11:04, 20 May 2024
Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components.
Equipment
Deposition Equipment
- ALD-01: Cambridge Nanotech S200 ALD
- CVD-01: Oxford PlasmaLab 100 PECVD
- CVD-02: Sandvik Furnace Stack
- PVD-02: Lesker PVD75 E-Beam/Thermal Evaporator
- PVD-03: Lesker PVD75 DC/RF Sputterer
- PVD-05: Denton Explorer14 Magnetron Sputterer