Difference between revisions of "Au (gold)"
Jump to navigation
Jump to search
| Line 41: | Line 41: | ||
| PVD-05 || 3 mTorr || 140 W || 4.6 Å s<sup>-1</sup> | | PVD-05 || 3 mTorr || 140 W || 4.6 Å s<sup>-1</sup> | ||
|- | |- | ||
| + | |} | ||
| + | |||
| + | '''PVD-05 Master Recipe:''' | ||
| + | |||
| + | Step T006 is the deposition step. | ||
| + | |||
| + | {| class="wikitable" | ||
| + | ! Step Number || T000 || T001 || T002 || T003 || T004 || T005 || T006 || T007 || T008 || T009 || T010 || T011 || T012 || T013 | ||
| + | |- | ||
| + | |- | ||
| + | | Step Time (sec) || 5 || 30 || 30 || 30 || 30 || 30 || [dep] || 30 || 30 || 30 || 30 || 30 || 300 || 5 | ||
| + | |-style="background-color:#FFFFFF" | ||
| + | | Min Vacuum Setpoint (Torr) || || || || || || || || || || || || || || | ||
| + | |- | ||
| + | | || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#DBFEFF" | ||
| + | | Gas - (PID or Fixed) || || PID || PID || PID || PID || PID || PID || PID || PID || PID || PID || PID || || | ||
| + | |-style="background-color:#FFFFFF" | ||
| + | | Gas - PID Master Gas Select || || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || || | ||
| + | |- | ||
| + | | Gas1 - Setpoint (sccm) || || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || || | ||
| + | |-style="background-color:#FFFFFF" | ||
| + | | Gas2 - Setpoint (sccm) || || || || || || || || || || || || || || | ||
| + | |- | ||
| + | | || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#DEB4DC" | ||
| + | |Gas PID Pressure (mTorr) || || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || || | ||
| + | |-style="background-color:#DCF5E9" | ||
| + | | RF Source - Sputter (Watts) || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#DCF5E9" | ||
| + | | RF Source - Cathode Select || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#DCF5E9" | ||
| + | | RF Source - Shutter || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#ECFA6F" | ||
| + | | DC 1 Source - Sputter (Watts) || || 25 || 50 || 75 || 100 || 125 || 140 || 120 || 100 || 80 || 60 || 25 || || | ||
| + | |-style="background-color:#ECFA6F" | ||
| + | | DC 1 Source - Cathode Select || || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || || | ||
| + | |-style="background-color:#ECFA6F" | ||
| + | | DC 1 Source - Shutter || || || || || || || Open || || || || || || || | ||
| + | |-style="background-color:#FAD86F" | ||
| + | | DC 2 Source - Sputter (Watts) || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#FAD86F" | ||
| + | | || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#FAD86F" | ||
| + | | DC 2 Source - Shutter || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#6FD2FA" | ||
| + | | Pressure Control (Throttle) || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || || | ||
| + | |-style="background-color:#FFFFFF" | ||
| + | | Ignition Pressure (mTorr) || || || || || || || || || || || || || || | ||
| + | |- | ||
| + | | || || || || || || || || || || || || || || | ||
| + | |-style="background-color:#E8F213" | ||
| + | | Rotation Speed (0-100%) || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || | ||
| + | |- | ||
| + | | End Process (Yes) || || || || || || || || || || || || || || Yes | ||
|} | |} | ||
Revision as of 13:15, 9 May 2024
Equipment
Deposition Equipment
- PVD-02: Lesker PVD75 E-Beam/Thermal Evaporator
- PVD-03: Lesker PVD75 DC/RF Sputterer
- PVD-04: Lesker PVD75 E-beam Evaporator
- PVD-05: Denton Explorer14 Magnetron Sputterer
Etching
Applications
Processes
Sputter Deposition Rates
| PVD Tool | Cathode 2 (DC; high mag) | Recorded | Cathode 3 (DC) | Recorded | Cathode 4 (DC; high mag) | Recorded | ||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Pressure | Power | Rate | Pressure | Power | Rate | Pressure | Power | Rate | ||||
| PVD-03 | 4 mTorr | 140 W | 3.1 Å s-1 | 3 mTorr | 140 W | 2.5 Å s-1 | 03/06/23 | 5 mTorr | 140 W | 3.1 Å s-1 | ||
| PVD Tool | Cathodes 1 & 3 (DC) | Recorded | ||
|---|---|---|---|---|
| Pressure | Power | Rate | ||
| PVD-05 | 3 mTorr | 140 W | 4.6 Å s-1 | |
PVD-05 Master Recipe:
Step T006 is the deposition step.
| Step Number | T000 | T001 | T002 | T003 | T004 | T005 | T006 | T007 | T008 | T009 | T010 | T011 | T012 | T013 |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Step Time (sec) | 5 | 30 | 30 | 30 | 30 | 30 | [dep] | 30 | 30 | 30 | 30 | 30 | 300 | 5 |
| Min Vacuum Setpoint (Torr) | ||||||||||||||
| Gas - (PID or Fixed) | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | |||
| Gas - PID Master Gas Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
| Gas1 - Setpoint (sccm) | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | |||
| Gas2 - Setpoint (sccm) | ||||||||||||||
| Gas PID Pressure (mTorr) | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | |||
| RF Source - Sputter (Watts) | ||||||||||||||
| RF Source - Cathode Select | ||||||||||||||
| RF Source - Shutter | ||||||||||||||
| DC 1 Source - Sputter (Watts) | 25 | 50 | 75 | 100 | 125 | 140 | 120 | 100 | 80 | 60 | 25 | |||
| DC 1 Source - Cathode Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
| DC 1 Source - Shutter | Open | |||||||||||||
| DC 2 Source - Sputter (Watts) | ||||||||||||||
| DC 2 Source - Shutter | ||||||||||||||
| Pressure Control (Throttle) | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | ||
| Ignition Pressure (mTorr) | ||||||||||||||
| Rotation Speed (0-100%) | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | |
| End Process (Yes) | Yes |