Difference between revisions of "Oxford Cobra ICP Etcher"
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| Line 27: | Line 27: | ||
* Etch of SiNx | * Etch of SiNx | ||
* Etch of InP | * Etch of InP | ||
| − | * Etch of Al, Cr, Ti, | + | * Etch of Al, Cr, Ti, hafnia, alumina .... |
- for a complete list of materials etched in the tool please refer to the SOP at the bottom off this page | - for a complete list of materials etched in the tool please refer to the SOP at the bottom off this page | ||
Revision as of 13:48, 5 May 2022
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| Tool Name | Oxford Cobra ICP Etcher |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Sam Azadi |
| Lab Location | Bay 2 |
| Tool Manufacturer | Oxford Instruments |
| Tool Model | Cobra PlasmaPro 100 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
Oxford PlasmaPro 100 is an inductively coupled plasma (ICP) etcher. The tool uses an RF magnetic field to induce an RF electric field and energize the electrons that result in the ionization of gas molecules and atoms at low pressures. The plasma created in the ICP tool is denser, which allows for a wider range of etching.
The tool is connected to the following gases: BCl3, Cl2, Ar, O2, SF6, CF4, and CHF3.
Applications
- Etch of Si
- Etch of SiO2
- Etch of SiNx
- Etch of InP
- Etch of Al, Cr, Ti, hafnia, alumina ....
- for a complete list of materials etched in the tool please refer to the SOP at the bottom off this page