Difference between revisions of "Process Resources"
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| Line 6: | Line 6: | ||
* [[Developers at QNF]] -- Under Construction | * [[Developers at QNF]] -- Under Construction | ||
* [[Ancillary Process Chemicals at QNF]] -- Under Construction | * [[Ancillary Process Chemicals at QNF]] -- Under Construction | ||
| − | * [[How to Make a Mask]] | + | * [[How to Make a Mask]] |
* [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] | * [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] | ||
Revision as of 14:55, 14 January 2025
General Process Documents
Lithography
- Resists at QNF
- Developers at QNF -- Under Construction
- Ancillary Process Chemicals at QNF -- Under Construction
- How to Make a Mask
- KemLab Resist Presentation
Film Characterization
- Deposition and Etch Characterization of LPCVD SiNx thin films
- ALD deposition of SiO2 using BDEAS and Ozone precursors