Difference between revisions of "Elionix ELS-7500EX E-Beam Lithography System"
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* [https://www.sciencedirect.com/science/article/pii/S0167931702004689 IPA:H<sub>2</sub>O for High Contrast Development of PMMA] | * [https://www.sciencedirect.com/science/article/pii/S0167931702004689 IPA:H<sub>2</sub>O for High Contrast Development of PMMA] | ||
* [https://upenn.box.com/s/geoiy7clkxj8w3hlrq6kfm89azbi62m3 Dose Time Calculator for Elionix ELS-7500EX] | * [https://upenn.box.com/s/geoiy7clkxj8w3hlrq6kfm89azbi62m3 Dose Time Calculator for Elionix ELS-7500EX] | ||
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| + | == Publications == | ||
Revision as of 13:16, 8 July 2025
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| Tool Name | Elionix ELS-7500EX E-Beam Lithography System |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Barth |
| Lab Location | Bay 4 |
| Tool Manufacturer | Elionix |
| Tool Model | ELS-7500EX |
| NEMO Designation | EBL-01 |
| Nearest Phone | 8-9799 |
| SOP Link | SOP |
Description
The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA.
Applications
- Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale
Allowed Materials
- Standard semiconductor materials
- Low vapor pressure metals
- Resists
Resources
SOPs & Troubleshooting
- SOP
- March 4, 2022: There is a minor issue with the vacuum in the loadlock. The loadlock will not pump down from a partially evacuated state. In order to pump the loadlock if it was not already vented, you must first vent it, and then pump it down again.
Resist and Process Data
- PMMA A2 and A4 Spin Curves
- PMMA A2 Contrast Curves
- CSAR-62 Contrast Curves
- ZEP Contrast Curves
- DisCharge Spin-on Anticharging Agent
- Cold Development for PMMA and ZEP
- IPA:H2O for High Contrast Development of PMMA
- Dose Time Calculator for Elionix ELS-7500EX