Difference between revisions of "Ti (titanium)"
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==Application== | ==Application== | ||
+ | |||
+ | ==Processes== | ||
+ | |||
+ | ===Sputter Deposition Rates=== | ||
+ | |||
+ | {| class="wikitable" | ||
+ | ! rowspan=2 | Material Name | ||
+ | ! colspan=3 | Cathode 2 (DC; high mag) | ||
+ | ! rowspan=2 | Recorded | ||
+ | ! colspan=3 | Cathode 3 (DC) | ||
+ | ! rowspan=2 | Recorded | ||
+ | ! colspan=3 | Cathode 4 (DC; high mag) | ||
+ | ! rowspan=2 | Recorded | ||
+ | |- | ||
+ | ! Pressure || Power || Rate || Pressure || Power || Rate || Pressure || Power || Rate | ||
+ | |- | ||
+ | | Ti(titanium) || 6 mTorr || 300 W || 1.8 Å s<sup>-1</sup> || || 5 mTorr || 300 W || 0.98 Å s<sup>-1</sup> || 03/06/23 || 6 mTorr || 300 W || 0.8 Å s<sup>-1</sup> || | ||
+ | |- | ||
+ | |} |
Revision as of 12:40, 9 May 2024
Titanium is a transition metal with atomic number 22 and symbol Ti. Titanium has a low density, high strength and is resistant to corrosion by water. It has relatively poor electrical and thermal conduction compared to most metals.
Equipment
Deposition Equipment
- PVD-02: Lesker PVD75 E-Beam/Thermal Evaporator
- PVD-04: Lesker PVD75 E-beam Evaporator
- PVD-03: Lesker PVD75 DC/RF Sputterer
- PVD-05: Denton Explorer14 Magnetron Sputterer
Etching
Application
Processes
Sputter Deposition Rates
Material Name | Cathode 2 (DC; high mag) | Recorded | Cathode 3 (DC) | Recorded | Cathode 4 (DC; high mag) | Recorded | ||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|
Pressure | Power | Rate | Pressure | Power | Rate | Pressure | Power | Rate | ||||
Ti(titanium) | 6 mTorr | 300 W | 1.8 Å s-1 | 5 mTorr | 300 W | 0.98 Å s-1 | 03/06/23 | 6 mTorr | 300 W | 0.8 Å s-1 |