Latest revision as of 16:07, 25 July 2025

Materials

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-= General Process Documents=
+= Materials =
-* [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation]
+* [[Au (gold) | Processing - Au]]
+* [[SiO2 (silicon dioxide) | Processing - SiO2]]
+* [[Ti (titanium) | Processing - Ti]]
-= Film Characterization=
+= Chemicals =
-* [https://upenn.app.box.com/file/1004242723681 Deposition and Etch Characterization of LPCVD SiNx thin films]
+* [[Resists at QNF]]
-* [https://upenn.app.box.com/file/1004880785762 ALD deposition of SiO2 using BDEAS and Ozone precursors]
+* [[Developers at QNF]] -- Under Construction
+* [[Ancillary Process Chemicals at QNF]] -- Under Construction
-= Soft Lithography =
-* [https://upenn.box.com/s/b6e694cf6r5qul32cmsjkbr9oydc6d7o Course Material for the QNF Soft Lithography Workshop]
-* [https://upenn.box.com/s/xrlkb6agcqae7ietb16mk5d84zqbcbr0 PDF Presentation for Biological Researchers]
-* [https://upenn.box.com/s/10wkjldwrt3f6it5ted0jo74b72eu0m4 PDF Presentation for ESE 536]
-* Training Videos
-:* [https://www.youtube.com/watch?v=ybFHtd2pPYs Training Video - Spin Coating Thick Resist]
-:* [https://www.youtube.com/watch?v=cRzLljt0VLs Training Video - Use of MA-03, ABM Mask Aligner]
-:* [https://www.youtube.com/watch?v=SCs87pYIn5w Training Video - Negative Resist First Mask Alignment Mark]
-:* [https://www.youtube.com/watch?v=Wzrsv_01ZNE Training Video - Developing SU8 Resist]
-:* [https://www.youtube.com/watch?v=powcV3r4IhM Training Video - Degassing PDMS]