Difference between revisions of "W master recipe"

From Quattrone Nanofabrication Facility
Jump to navigation Jump to search
(W master recipe)
 
 
(4 intermediate revisions by the same user not shown)
Line 1: Line 1:
===== Tungsten (W) =====
+
> [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]]  <
 +
 
 +
Step T010 is the deposition step.
  
 
{| class="wikitable"
 
{| class="wikitable"
! Step Number || T000 || T001 || T002 || T003 || T004 || T005 || T006
+
! Step Number || T000 || T001 || T002 || T003 || T004 || T005 || T006 || T007 || T008 || T009 || T010 || T011 || T012
 
|-
 
|-
 
|-
 
|-
| Step Time (sec) || - || || - || - || - || - || -
+
| Step Time (sec) || 5 || 60 || 60 || 60 || 60 || 60 || 60 || 60 || 60 || 60 || [dep] || 200 || 5
 
|-style="background-color:#FFFFFF"  
 
|-style="background-color:#FFFFFF"  
| Min Vacuum Setpoint (Torr) || - || - || - || - || - || - || -
+
| Min Vacuum Setpoint (Torr) || ||  ||  ||  || ||  || || || ||  ||  ||  || 
 
|-
 
|-
|  ||  ||   ||  ||  ||  ||  ||  
+
|  ||  || ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  
 
|-style="background-color:#DBFEFF"  
 
|-style="background-color:#DBFEFF"  
| Gas - (PID or Fixed) || - || - || - || - || - || - || -
+
| Gas - (PID or Fixed) || || PID || PID || PID || PID || PID || PID || PID || PID || PID || PID || ||  
 
|-style="background-color:#FFFFFF"
 
|-style="background-color:#FFFFFF"
| Gas - PID Master Gas Select || - || - || - || - || - || - || -
+
| Gas - PID Master Gas Select || || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 ||  ||
 
|-  
 
|-  
| Gas1 - Setpoint (sccm) || - || - || - || - || - || - || -
+
| Gas1 - Setpoint (sccm) || || 30 || 30 || 30 || 30 || 30 || 30 || 30 || 30 || 30 || 30 || ||  
 
|-style="background-color:#FFFFFF"
 
|-style="background-color:#FFFFFF"
| Gas2 - Setpoint (sccm) || - ||  - || - || - || - || - || -
+
| Gas2 - Setpoint (sccm) ||  ||  ||  ||  ||  ||  || ||  || || || || ||  
 
|-
 
|-
|  ||  ||   ||  ||  ||  ||  ||  
+
|  ||  || ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  
 
|-style="background-color:#DEB4DC"  
 
|-style="background-color:#DEB4DC"  
|Gas PID Pressure (mTorr) || - || - || - || - || - || - || -
+
|Gas PID Pressure (mTorr) || || 30 || 25 || 20 || 15 || 12 || 10 || 8 || 6 || 4 || 3 || ||
 
|-style="background-color:#DCF5E9"  
 
|-style="background-color:#DCF5E9"  
| RF Source - Sputter (Watts) || - || - || - || - || - || - || -
+
| RF Source - Sputter (Watts) || || || || || || || ||  ||  ||  ||  ||  || 
 
|-style="background-color:#DCF5E9"  
 
|-style="background-color:#DCF5E9"  
| RF Source - Cathode Select || - ||  - || - || - || - || - || -
+
| RF Source - Cathode Select ||  ||  ||  ||  ||  ||  || ||  || || || || ||
 
|-style="background-color:#DCF5E9"  
 
|-style="background-color:#DCF5E9"  
| RF Source - Shutter || - ||  - || - || - || - || - || -
+
| RF Source - Shutter || ||  || || || || || ||  ||  ||  ||  ||  || 
 
|-style="background-color:#ECFA6F"  
 
|-style="background-color:#ECFA6F"  
| DC 1 Source - Sputter (Watts) || - || - || - || - || - || - || -
+
| DC 1 Source - Sputter (Watts) || || 100 || 100 || 100 || 150 || 200 || 250 || 300 || 350 || 400 || 450 ||  ||  
 
|-style="background-color:#ECFA6F"  
 
|-style="background-color:#ECFA6F"  
| DC 1 Source - Cathode Select || - || - || - || - || - || - || -
+
| DC 1 Source - Cathode Select || || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || ||  
 
|-style="background-color:#ECFA6F"  
 
|-style="background-color:#ECFA6F"  
| DC 1 Source - Shutter || - || - || - || - || - || - || -
+
| DC 1 Source - Shutter || || || || || || ||  ||  ||  ||  || Open ||  ||  
 
|-style="background-color:#FAD86F"  
 
|-style="background-color:#FAD86F"  
| DC 2 Source - Sputter (Watts) || - ||  - || - || - || - || - || -
+
| DC 2 Source - Sputter (Watts) || ||  ||  ||  || || || || ||  ||  ||  ||  ||  
 
|-style="background-color:#FAD86F"
 
|-style="background-color:#FAD86F"
|  ||  ||  ||  ||  ||  ||  ||  
+
|  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  ||  
 
|-style="background-color:#FAD86F"
 
|-style="background-color:#FAD86F"
| DC 2 Source - Shutter || - || - || - || - || - || - || -
+
| DC 2 Source - Shutter || || || || || || ||  ||  ||  ||  ||  ||  ||  
 
|-style="background-color:#6FD2FA"  
 
|-style="background-color:#6FD2FA"  
| Pressure Control (Throttle) || - || - || - || - || - || - || -
+
| Pressure Control (Throttle) || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || ||  
 
|-style="background-color:#FFFFFF"
 
|-style="background-color:#FFFFFF"
| Ignition Pressure (mTorr) || - ||  - || - || - || - || - || -
+
| Ignition Pressure (mTorr) || ||  ||  ||  ||  ||  ||  ||  || || || || ||
 
|-
 
|-
|  ||  ||   ||  ||  ||  ||  ||  
+
|  ||  || ||  ||  ||  ||  ||  ||  ||  ||  ||  || || 
 
|-style="background-color:#E8F213"  
 
|-style="background-color:#E8F213"  
| Rotation Speed (0-100%) || - || - || - || - || - || - || -
+
| Rotation Speed (0-100%) || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 ||
 
|-
 
|-
| End Process (Yes) || - ||  - || - || - || - || - || -
+
| End Process (Yes) || ||  ||  ||  || || || || ||  ||  ||  ||  || Yes
 
|}
 
|}

Latest revision as of 12:39, 31 January 2023

> Click here to return to PVD-05 <

Step T010 is the deposition step.

Step Number T000 T001 T002 T003 T004 T005 T006 T007 T008 T009 T010 T011 T012
Step Time (sec) 5 60 60 60 60 60 60 60 60 60 [dep] 200 5
Min Vacuum Setpoint (Torr)
Gas - (PID or Fixed) PID PID PID PID PID PID PID PID PID PID
Gas - PID Master Gas Select 1 1 1 1 1 1 1 1 1 1
Gas1 - Setpoint (sccm) 30 30 30 30 30 30 30 30 30 30
Gas2 - Setpoint (sccm)
Gas PID Pressure (mTorr) 30 25 20 15 12 10 8 6 4 3
RF Source - Sputter (Watts)
RF Source - Cathode Select
RF Source - Shutter
DC 1 Source - Sputter (Watts) 100 100 100 150 200 250 300 350 400 450
DC 1 Source - Cathode Select 1 1 1 1 1 1 1 1 1 1
DC 1 Source - Shutter Open
DC 2 Source - Sputter (Watts)
DC 2 Source - Shutter
Pressure Control (Throttle) Yes Yes Yes Yes Yes Yes Yes Yes Yes Yes Yes
Ignition Pressure (mTorr)
Rotation Speed (0-100%) 50 50 50 50 50 50 50 50 50 50 50 50
End Process (Yes) Yes