Difference between revisions of "Ag master recipe"
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(Ag master recipe) |
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+ | > [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]] < | ||
+ | Step T006 is the deposition step. Note the extra long cool-down time in step T012. Reducing the cool-down time will result in significant surface oxidation. Please do not alter this time. | ||
+ | |||
+ | {| class="wikitable" | ||
+ | ! Step Number || T000 || T001 || T002 || T003 || T004 || T005 || T006 || T007 || T008 || T009 || T010 || T011 || T012 || T013 | ||
+ | |- | ||
+ | |- | ||
+ | | Step Time (sec) || 5 || 30 || 30 || 30 || 30 || 30 || [dep] || 30 || 30 || 30 || 30 || 30 || 900 || 5 | ||
+ | |-style="background-color:#FFFFFF" | ||
+ | | Min Vacuum Setpoint (Torr) || || || || || || || || || || || || || || | ||
+ | |- | ||
+ | | || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#DBFEFF" | ||
+ | | Gas - (PID or Fixed) || || PID || PID || PID || PID || PID || PID || PID || PID || PID || PID || PID || || | ||
+ | |-style="background-color:#FFFFFF" | ||
+ | | Gas - PID Master Gas Select || || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || || | ||
+ | |- | ||
+ | | Gas1 - Setpoint (sccm) || || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || 10 || || | ||
+ | |-style="background-color:#FFFFFF" | ||
+ | | Gas2 - Setpoint (sccm) || || || || || || || || || || || || || || | ||
+ | |- | ||
+ | | || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#DEB4DC" | ||
+ | |Gas PID Pressure (mTorr) || || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || 3 || || | ||
+ | |-style="background-color:#DCF5E9" | ||
+ | | RF Source - Sputter (Watts) || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#DCF5E9" | ||
+ | | RF Source - Cathode Select || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#DCF5E9" | ||
+ | | RF Source - Shutter || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#ECFA6F" | ||
+ | | DC 1 Source - Sputter (Watts) || || 25 || 50 || 75 || 100 || 125 || 140 || 120 || 100 || 80 || 60 || 25 || || | ||
+ | |-style="background-color:#ECFA6F" | ||
+ | | DC 1 Source - Cathode Select || || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || 1 || || | ||
+ | |-style="background-color:#ECFA6F" | ||
+ | | DC 1 Source - Shutter || || || || || || || Open || || || || || || || | ||
+ | |-style="background-color:#FAD86F" | ||
+ | | DC 2 Source - Sputter (Watts) || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#FAD86F" | ||
+ | | || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#FAD86F" | ||
+ | | DC 2 Source - Shutter || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#6FD2FA" | ||
+ | | Pressure Control (Throttle) || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || Yes || || | ||
+ | |-style="background-color:#FFFFFF" | ||
+ | | Ignition Pressure (mTorr) || || || || || || || || || || || || || || | ||
+ | |- | ||
+ | | || || || || || || || || || || || || || || | ||
+ | |-style="background-color:#E8F213" | ||
+ | | Rotation Speed (0-100%) || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || 50 || | ||
+ | |- | ||
+ | | End Process (Yes) || || || || || || || || || || || || || || Yes | ||
+ | |} |
Latest revision as of 11:27, 31 January 2023
> Click here to return to PVD-05 <
Step T006 is the deposition step. Note the extra long cool-down time in step T012. Reducing the cool-down time will result in significant surface oxidation. Please do not alter this time.
Step Number | T000 | T001 | T002 | T003 | T004 | T005 | T006 | T007 | T008 | T009 | T010 | T011 | T012 | T013 |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Step Time (sec) | 5 | 30 | 30 | 30 | 30 | 30 | [dep] | 30 | 30 | 30 | 30 | 30 | 900 | 5 |
Min Vacuum Setpoint (Torr) | ||||||||||||||
Gas - (PID or Fixed) | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | PID | |||
Gas - PID Master Gas Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
Gas1 - Setpoint (sccm) | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | 10 | |||
Gas2 - Setpoint (sccm) | ||||||||||||||
Gas PID Pressure (mTorr) | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | 3 | |||
RF Source - Sputter (Watts) | ||||||||||||||
RF Source - Cathode Select | ||||||||||||||
RF Source - Shutter | ||||||||||||||
DC 1 Source - Sputter (Watts) | 25 | 50 | 75 | 100 | 125 | 140 | 120 | 100 | 80 | 60 | 25 | |||
DC 1 Source - Cathode Select | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | 1 | |||
DC 1 Source - Shutter | Open | |||||||||||||
DC 2 Source - Sputter (Watts) | ||||||||||||||
DC 2 Source - Shutter | ||||||||||||||
Pressure Control (Throttle) | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | Yes | ||
Ignition Pressure (mTorr) | ||||||||||||||
Rotation Speed (0-100%) | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | 50 | |
End Process (Yes) | Yes |