Difference between revisions of "EVG 620 Wafer Bond Aligner"

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m (Protected "EVG 620 Wafer Bond Aligner" ([Edit=Allow only administrators] (indefinite) [Move=Allow only administrators] (indefinite)) [cascading])
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| imagecaption =  
 
| imagecaption =  
 
| Instrument_Type = Back End
 
| Instrument_Type = Back End
| Staff_Manager = Eric Johnston
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| Staff_Manager = [[Eric Johnston | Eric Johnston]]
| Lab_Location = Bay 2
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| Lab_Location = Bay 4
 
| Tool_Manufacturer = EV Group
 
| Tool_Manufacturer = EV Group
 
| Tool_Model = 620 Aligner
 
| Tool_Model = 620 Aligner
| Iris_Designation = BE-02
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| NEMO_Designation = BE-02
 
| Lab_Phone = XXXXX
 
| Lab_Phone = XXXXX
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/Wafer_Bond_Aligner_SOP.htm SOP]
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/Wafer_Bond_Aligner_SOP.htm SOP]

Latest revision as of 13:23, 3 January 2024


EVG 620 Wafer Bond Aligner
BE-02.jpeg
Tool Name EVG 620 Wafer Bond Aligner
Instrument Type Back End
Staff Manager Eric Johnston
Lab Location Bay 4
Tool Manufacturer EV Group
Tool Model 620 Aligner
NEMO Designation BE-02
Lab Phone XXXXX
SOP Link SOP

Description

Known for its high level of automation and reliability, the EVG620 Bond Alignment System is designed for wafer-to-wafer alignment up to 150 mm wafer sizes. The EV Group´s bond alignment systems offer highest precision, flexibility, ease of use and modular upgrade capability and have been qualified in numerous high throughput production environments. The precision of EVG´s bond alignment system accommodates most demanding alignment processes in MEMS production and in emerging fields like 3D integration applications.

Applications
  • Aligning 4" wafers for bonding in the EVG 620
  • Maximum stack height: 4.5 mm
  • Range of alignment: X, Y ± 5.0 mm
  • Alignment accuracy:
  • 0.5 um for glass/silicon
  • 1.0 um for silicon/silicon
  • Contact force: 1-40 N


Resources

SOPs & Troubleshooting