Difference between revisions of "RTA-02"
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| name = AET Thermal RX | | name = AET Thermal RX | ||
| Tool_Name = Rapid Thermal Annealer - 02 | | Tool_Name = Rapid Thermal Annealer - 02 | ||
| − | | image = [[Image:RTA02.jpg| | + | | image = [[Image:RTA02.jpg|200px]] |
| imagecaption = | | imagecaption = | ||
| Instrument_Type = Thermal Processing | | Instrument_Type = Thermal Processing | ||
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| Tool_Manufacturer = AET | | Tool_Manufacturer = AET | ||
| Tool_Model = Thermal RX | | Tool_Model = Thermal RX | ||
| − | | NEMO_Designation = RTA- | + | | NEMO_Designation = RTA-02 |
| Lab_Phone = 215-898-9736 | | Lab_Phone = 215-898-9736 | ||
}} | }} | ||
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== Resources == | == Resources == | ||
===== SOP ===== | ===== SOP ===== | ||
| − | <pdf height=" | + | <pdf height="600"> File:RTA02_SOP_20250131.pdf</pdf> |
Latest revision as of 15:42, 3 February 2025
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| Tool Name | Rapid Thermal Annealer - 02 |
|---|---|
| Instrument Type | Thermal Processing |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 1 |
| Tool Manufacturer | AET |
| Tool Model | Thermal RX |
| NEMO Designation | RTA-02 |
| Lab Phone | 215-898-9736 |
| SOP Link | {{{SOP Link}}} |
Description
The Rapid Thermal Annealer-02 anneals the sample up to 1200° C. The processes can be run under atmospheric pressure in Nitrogen, Forming Gas, and Argon environments. The tool can hold 4’’ wafers or smaller chips.
Resources
SOP