Difference between revisions of "Intlvac E-beam Evaporator"

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| name = Intlvac E-Beam Evaporator
 
| name = Intlvac E-Beam Evaporator
 
| Tool_Name = Intlvac E-Beam Evaporator
 
| Tool_Name = Intlvac E-Beam Evaporator
| image = [[Image:PVD-09.jpeg|300px]]
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| image = [[Image:PVD-09.jpg|300px]]
 
| imagecaption =  
 
| imagecaption =  
 
| Instrument_Type = Physical vapor deposition
 
| Instrument_Type = Physical vapor deposition
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| Lab_Location = Bay 2
 
| Lab_Location = Bay 2
 
| Tool_Manufacturer = Intlvac
 
| Tool_Manufacturer = Intlvac
| Tool_Model =  
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| Tool_Model = Nanochrome
 
| NEMO_Designation = PVD-09
 
| NEMO_Designation = PVD-09
 
| Lab_Phone = 215-898-9748
 
| Lab_Phone = 215-898-9748
| SOP Link = [https://www.seas.upenn.edu/~nanosop/PVD75_e-beam_SOP.htm SOP]
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| SOP Link = [https://nemo.nano.upenn.edu/media/tool_documents/pvd-09-intlvac-evap/PVD09_SOP_v01.docx.pdf SOP]
 
}}
 
}}
  
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===== The tool =====
 
===== The tool =====
  
The IntlVac Electron Beam Evaporator has a base process chamber pressure in the e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces.
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The IntlVac Electron Beam Evaporator has a base process chamber pressure in the low e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces.
  
 
===== Available materials =====
 
===== Available materials =====
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===== SOPs & Troubleshooting =====
 
===== SOPs & Troubleshooting =====
  
Link:
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* [https://nemo.nano.upenn.edu/media/tool_documents/pvd-09-intlvac-evap/PVD09_SOP_v01.docx.pdf PVD-09 SOP]

Latest revision as of 15:46, 20 September 2024


Intlvac E-Beam Evaporator
PVD-09.jpg
Tool Name Intlvac E-Beam Evaporator
Instrument Type Physical vapor deposition
Staff Manager David Barth
Lab Location Bay 2
Tool Manufacturer Intlvac
Tool Model Nanochrome
NEMO Designation PVD-09
Lab Phone 215-898-9748
SOP Link SOP

Description

The tool

The IntlVac Electron Beam Evaporator has a base process chamber pressure in the low e-8 Torr range with substrate heating and ozone purging capabilities. Deposition rates are monitored by an automated magazine of 6MHz crystals. The tool can be used to process a single 4 inch wafer at a time or a selection of small chips/pieces.

Available materials

The tool contains the following materials:

  • Al - Aluminum
  • Ti - Titanium

Resources

SOPs & Troubleshooting