Difference between revisions of "Process Resources"
Jump to navigation
Jump to search
| (6 intermediate revisions by the same user not shown) | |||
| Line 1: | Line 1: | ||
= General Process Documents= | = General Process Documents= | ||
| − | * [https:// | + | * [https://www.youtube.com/watch?v=WSbXpLe6_fE Video - How to Make Chips with Nanofabrication] |
| + | * [[How plasma etch works]] | ||
| + | * [[Au (gold) | Processing - Au]] | ||
| + | * [[SiO2 (silicon dioxide) | Processing - SiO2]] | ||
| + | * [[Ti (titanium) | Processing - Ti]] | ||
= Lithography = | = Lithography = | ||
| + | * [[How to Make a Mask]] | ||
* [[Resists at QNF]] | * [[Resists at QNF]] | ||
| − | * [[Developers at QNF]] -- Under Construction | + | * [[Developers at QNF]] -- Under Construction |
* [[Ancillary Process Chemicals at QNF]] -- Under Construction | * [[Ancillary Process Chemicals at QNF]] -- Under Construction | ||
| − | * [https:// | + | * [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] |
= Film Characterization= | = Film Characterization= | ||
Latest revision as of 15:09, 14 January 2025
General Process Documents
- Video - How to Make Chips with Nanofabrication
- How plasma etch works
- Processing - Au
- Processing - SiO2
- Processing - Ti
Lithography
- How to Make a Mask
- Resists at QNF
- Developers at QNF -- Under Construction
- Ancillary Process Chemicals at QNF -- Under Construction
- KemLab Resist Presentation
Film Characterization
- Deposition and Etch Characterization of LPCVD SiNx thin films
- ALD deposition of SiO2 using BDEAS and Ozone precursors