Difference between revisions of "Elionix ELS-7500EX E-Beam Lithography System"
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| − | [[Category:Lithography]] | + | [[Category:Lithography]][[Category:E-Beam Lithography]][[Category:Equipment]] |
{{EquipmentInfo | {{EquipmentInfo | ||
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| imagecaption = | | imagecaption = | ||
| Instrument_Type = Lithography | | Instrument_Type = Lithography | ||
| − | | Staff_Manager = David Barth | + | | Staff_Manager = [[David Barth | David Barth]] |
| Lab_Location = Bay 4 | | Lab_Location = Bay 4 | ||
| Tool_Manufacturer = Elionix | | Tool_Manufacturer = Elionix | ||
| Tool_Model = ELS-7500EX | | Tool_Model = ELS-7500EX | ||
| − | | | + | | NEMO_Designation = EBL-01 |
| Lab_Phone = 8-9799 | | Lab_Phone = 8-9799 | ||
| SOP Link = [https://repository.upenn.edu/scn_sop/21/ SOP] | | SOP Link = [https://repository.upenn.edu/scn_sop/21/ SOP] | ||
| Line 25: | Line 25: | ||
* Standard semiconductor materials | * Standard semiconductor materials | ||
* Low vapor pressure metals | * Low vapor pressure metals | ||
| − | * Resists | + | * Resists |
| + | ** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Standard_e-beam_Resists Standard e-beam resists] | ||
| + | ** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Stockroom_e-beam_Resists Stockroom e-beam resists] | ||
| + | ** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Other_Resists PMGI] | ||
== Resources == | == Resources == | ||
| Line 31: | Line 34: | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
* [https://repository.upenn.edu/scn_sop/21/ SOP] | * [https://repository.upenn.edu/scn_sop/21/ SOP] | ||
| + | * March 4, 2022: There is a minor issue with the vacuum in the loadlock. The loadlock will not pump down from a partially evacuated state. In order to pump the loadlock if it was not already vented, you must first vent it, and then pump it down again. | ||
===== Resist and Process Data ===== | ===== Resist and Process Data ===== | ||
| Line 41: | Line 45: | ||
* [https://avs.scitation.org/doi/full/10.1116/1.2366698 Cold Development for PMMA and ZEP] | * [https://avs.scitation.org/doi/full/10.1116/1.2366698 Cold Development for PMMA and ZEP] | ||
* [https://www.sciencedirect.com/science/article/pii/S0167931702004689 IPA:H<sub>2</sub>O for High Contrast Development of PMMA] | * [https://www.sciencedirect.com/science/article/pii/S0167931702004689 IPA:H<sub>2</sub>O for High Contrast Development of PMMA] | ||
| + | * [https://upenn.box.com/s/geoiy7clkxj8w3hlrq6kfm89azbi62m3 Dose Time Calculator for Elionix ELS-7500EX] | ||
| + | |||
| + | == Publications == | ||
| + | [[Electrically driven long-range solid-state amorphization in ferroic In2Se3 (10.1038/s41586-024-08156-8)]] | ||
Latest revision as of 12:29, 28 July 2025
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| Tool Name | Elionix ELS-7500EX E-Beam Lithography System |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Barth |
| Lab Location | Bay 4 |
| Tool Manufacturer | Elionix |
| Tool Model | ELS-7500EX |
| NEMO Designation | EBL-01 |
| Nearest Phone | 8-9799 |
| SOP Link | SOP |
Description
The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA.
Applications
- Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale
Allowed Materials
- Standard semiconductor materials
- Low vapor pressure metals
- Resists
Resources
SOPs & Troubleshooting
- SOP
- March 4, 2022: There is a minor issue with the vacuum in the loadlock. The loadlock will not pump down from a partially evacuated state. In order to pump the loadlock if it was not already vented, you must first vent it, and then pump it down again.
Resist and Process Data
- PMMA A2 and A4 Spin Curves
- PMMA A2 Contrast Curves
- CSAR-62 Contrast Curves
- ZEP Contrast Curves
- DisCharge Spin-on Anticharging Agent
- Cold Development for PMMA and ZEP
- IPA:H2O for High Contrast Development of PMMA
- Dose Time Calculator for Elionix ELS-7500EX