Difference between revisions of "QNF Equipment Owner Matrix"

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(Remove BE-05 -- MPT Corp. RTP-600S Rapid Thermal Annealer)
 
(6 intermediate revisions by 2 users not shown)
Line 8: Line 8:
 
| K&S Wire Bonder || BE-03 || Backend || [[Eric_Johnston | Eric Johnston]]
 
| K&S Wire Bonder || BE-03 || Backend || [[Eric_Johnston | Eric Johnston]]
 
|-
 
|-
−
| ADT 7100 Dicing Saw || BE-04 || Backend || [[Eric_Johnston | Eric Johnston]]
+
| ADT 7100 Dicing Saw || BE-04 || Backend || [[Travis Venables | Travis Venables]]
 
|-
 
|-
−
| MPT Corp. RTP-600S Rapid Thermal Annealer || BE-05 || Backend || [[David_Barth | David Barth]]
+
| TPT Wire Bonder || BE-06 || Backend || [[Eric_Johnston | Eric Johnston]]
 
|-
 
|-
−
| Tousimis Critical Point Dryer || CPD-01 || Backend || [[Kyle_Keenan | Kyle Keenan]]
+
| Brewer Spinner (White Light) || SPN-07 || Backend || [[Ana Cohen | Ana Cohen]]
 
|-
 
|-
 
| Cambridge Nanotech S200 ALD || ALD-01 || Deposition || [[Sam Azadi | Sam Azadi]]
 
| Cambridge Nanotech S200 ALD || ALD-01 || Deposition || [[Sam Azadi | Sam Azadi]]
 
|-
 
|-
−
| Ultratech Fiji G2 ALD || ALD-02 || Deposition || Faculty Managed
+
| Ultratech Fiji G2 ALD || ALD-02 || Deposition || [[Lucas Barreto | Lucas Barreto]]
 
|-
 
|-
 
| Veeco Savannah 200 || ALD-03 || Deposition || [[Sam Azadi | Sam Azadi]]
 
| Veeco Savannah 200 || ALD-03 || Deposition || [[Sam Azadi | Sam Azadi]]
 
|-
 
|-
 
| Oxford PlasmaLab 100 PECVD || CVD-01 || Deposition || [[Sam Azadi | Sam Azadi]]
 
| Oxford PlasmaLab 100 PECVD || CVD-01 || Deposition || [[Sam Azadi | Sam Azadi]]
−
|-
 
−
| MRL Wet/Dry Thermal Oxide || CVD-02 A || Deposition || [[Sam Azadi | Sam Azadi]]
 
−
|-
 
−
| MRL LPCVD Silicon Nitride || CVD-02 B || Deposition || [[Sam Azadi | Sam Azadi]]
 
−
|-
 
−
| MRL Anneal 1 || CVD-02 C || Deposition || [[Sam Azadi | Sam Azadi]]
 
−
|-
 
−
| MRL Anneal 2 || CVD-02 D || Deposition || [[Sam Azadi | Sam Azadi]]
 
 
|-
 
|-
 
| SMI MOCVD, Horizontal Reactor || CVD-04 H || Deposition || Faculty Managed
 
| SMI MOCVD, Horizontal Reactor || CVD-04 H || Deposition || Faculty Managed
Line 38: Line 30:
 
| Lesker PVD75 E-Beam/Thermal Evaporator || PVD-02 || Deposition || [[David_Barth | David Barth]]
 
| Lesker PVD75 E-Beam/Thermal Evaporator || PVD-02 || Deposition || [[David_Barth | David Barth]]
 
|-
 
|-
−
| Lesker PVD75 DC/RF Sputterer || PVD-03 || Deposition || [[David_Barth | David Barth]]
+
| Lesker PVD75 DC/RF Sputterer || PVD-03 || Deposition || [[Dan Sabrsula | Dan Sabrsula]]
 
|-
 
|-
−
| Lesker PVD75 E-beam Evaporator || PVD-04 || Deposition || [[David_Barth | David Barth]]
+
| Lesker PVD75 E-beam Evaporator || PVD-04 || Deposition || [[Dan Sabrsula | Dan Sabrsula]]
 
|-
 
|-
−
| Denton Explorer14 Magnetron Sputterer || PVD-05 || Deposition || [[Sam Azadi | Sam Azadi]]
+
| Denton Explorer14 Magnetron Sputterer || PVD-05 || Deposition || [[Dan Sabrsula | Dan Sabrsula]]
 
|-
 
|-
 
| Evatec Clusterline 200 II || PVD-06 || Deposition || Faculty Managed
 
| Evatec Clusterline 200 II || PVD-06 || Deposition || Faculty Managed
 
|-
 
|-
−
| Anatech SCE-108 Barrel Asher || DE-02 || Dry Etch || [[Kyle Keenan | Kyle Keenan]]
+
| Intlvac E-beam Evaporator || PVD-09 || Deposition || [[Dan Sabrsula | Dan Sabrsula]]
 +
|-
 +
| Intlvac IBE Ion Mill || DE-01 || Dry Etch || [[Sam Azadi | Sam Azadi]]
 +
|-
 +
| Anatech SCE-108 Barrel Asher || DE-02 || Dry Etch || [[Ana Cohen | Ana Cohen]]
 
|-
 
|-
 
| SPTS Si DRIE || DE-03 || Dry Etch || [[Sam Azadi | Sam Azadi]]
 
| SPTS Si DRIE || DE-03 || Dry Etch || [[Sam Azadi | Sam Azadi]]
Line 56: Line 52:
 
| SPTS/Xactix XeF2 Isotropic Etcher || DE-06 || Dry Etch || [[Sam Azadi | Sam Azadi]]
 
| SPTS/Xactix XeF2 Isotropic Etcher || DE-06 || Dry Etch || [[Sam Azadi | Sam Azadi]]
 
|-
 
|-
−
| Jupiter II RIE Plasma Etcher || DE-08 || Dry Etch || [[Sam Azadi | Sam Azadi]]
+
| Jupiter II RIE Plasma Etcher || DE-08 || Dry Etch || [[Lucas Barreto | Lucas Barreto]]
 
|-
 
|-
−
| Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[Eric_Johnston | Eric Johnston]]
+
| Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[David_Barth | David Barth]]
 
|-
 
|-
 
| Zeiss Axio Imager M2m Microscope (1 of 4) || MET-12 || Inspection || [[Kyle Keenan | Kyle Keenan]]
 
| Zeiss Axio Imager M2m Microscope (1 of 4) || MET-12 || Inspection || [[Kyle Keenan | Kyle Keenan]]
Line 75: Line 71:
 
|-
 
|-
 
| Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David Barth]]
 
| Litho Workstation for BEAMER and TRACER || EBL-02 || Lithography || [[David_Barth | David Barth]]
 +
|-
 +
| Raith EBPG5200+ E-Beam Lithography System || EBL-03 || Lithography || [[David_Barth | David Barth]]
 
|-
 
|-
 
| Heidelberg DWL 66+ Laser Writer || LW-01 || Lithography || [[Ana Cohen | Ana Cohen]]
 
| Heidelberg DWL 66+ Laser Writer || LW-01 || Lithography || [[Ana Cohen | Ana Cohen]]
Line 85: Line 83:
 
|-
 
|-
 
| Hawks/Genesis HMDS Vapor Prime Oven || OVN-01 || Lithography || [[Kyle Keenan | Kyle Keenan]]
 
| Hawks/Genesis HMDS Vapor Prime Oven || OVN-01 || Lithography || [[Kyle Keenan | Kyle Keenan]]
−
|-
 
−
| SUSS MicroTec AS8 AltaSpray || RC-01 || Lithography || [[Ana Cohen | Ana Cohen]]
 
 
|-
 
|-
 
| KLA Tencor P7 2D profilometer || MET-01 || Metrology || [[David_Barth | David Barth]]
 
| KLA Tencor P7 2D profilometer || MET-01 || Metrology || [[David_Barth | David Barth]]
Line 98: Line 94:
 
| Filmetrics Profilm3D Optical Profilometer || MET-05 || Metrology || [[David_Barth | David Barth]]
 
| Filmetrics Profilm3D Optical Profilometer || MET-05 || Metrology || [[David_Barth | David Barth]]
 
|-
 
|-
−
| Woollam V-VASE Ellipsometer || MET-06 || Metrology || [[Eric_Johnston | Eric Johnston]]
+
| Woollam V-VASE Ellipsometer || MET-06 || Metrology || [[Lucas Barreto | Lucas Barreto]]
 
|-
 
|-
 
| Jandel Multi Height Four Point Probe || MET-08 || Metrology || [[Sam Azadi | Sam Azadi]]
 
| Jandel Multi Height Four Point Probe || MET-08 || Metrology || [[Sam Azadi | Sam Azadi]]
 
|-
 
|-
−
| Micromanipulator 4060 Probe Station || MET-09 || Metrology || [[David_Barth | David Barth]]
+
| Micromanipulator 4060 Probe Station || MET-09 || Metrology || [[Dan Sabrsula | Dan Sabrsula]]
 +
|-
 +
| Filmetrics F50 (White Light) || MET-11 || Metrology || [[David_Barth | David Barth]]
 +
|-
 +
| SUSS MicroTec AS8 AltaSpray || RC-01 || Resist Coating || [[Ana Cohen | Ana Cohen]]
 +
|-
 +
| CEE Apogee Spinner - Acetone Soluble Resist || SPN-01 || Resist Coating || [[Ana Cohen | Ana Cohen]]
 +
|-
 +
| CEE Apogee Spinner - LOR/PMGI/Polyimide || SPN-03 || Resist Coating || [[Ana Cohen | Ana Cohen]]
 +
|-
 +
| ReynoldsTech Spinner - Negative Resist || SPN-04 || Resist Coating || [[Ana Cohen | Ana Cohen]]
 +
|-
 +
| Apogee Spinner - E-Beam || SPN-06 || Resist Coating || [[Ana Cohen | Ana Cohen]]
 +
|-
 +
| CEE Apogee Spinner - Negative Epoxy Resist || SPN-08 || Soft Lithography || [[Ana Cohen | Ana Cohen]]
 
|-
 
|-
−
| Filmetrics F50 (white light) || MET-11 || Metrology || [[David_Barth | David Barth]]
+
| CEE Apogee Spinner - PDMS || SPN-09 || Soft Lithography || [[Ana Cohen | Ana Cohen]]
 
|-
 
|-
 
| Anatech SCE-106 Barrel Asher || DE-07 || Soft Lithography || [[Ana Cohen | Ana Cohen]]
 
| Anatech SCE-106 Barrel Asher || DE-07 || Soft Lithography || [[Ana Cohen | Ana Cohen]]
Line 112: Line 122:
 
| SCS PDS2010 Parylene Coater || PVD-07 || Soft Lithography || [[Kyle_Keenan | Kyle Keenan]]
 
| SCS PDS2010 Parylene Coater || PVD-07 || Soft Lithography || [[Kyle_Keenan | Kyle Keenan]]
 
|-
 
|-
−
| Silanization Dessicator || PVD-08 || Soft Lithography || [[Eric_Johnston | Eric Johnston]]
+
| Silanization Dessicator || PVD-08 || Soft Lithography || [[Ana Cohen | Ana Cohen]]
 +
|-
 +
| MRL Wet/Dry Thermal Oxide || CVD-02 A || Thermal Processing || [[Sam Azadi | Sam Azadi]]
 +
|-
 +
| MRL LPCVD Silicon Nitride || CVD-02 B || Thermal Processing || [[Sam Azadi | Sam Azadi]]
 +
|-
 +
| MRL Anneal 1 || CVD-02 C || Thermal Processing || [[Sam Azadi | Sam Azadi]]
 +
|-
 +
| MRL Anneal 2 || CVD-02 D || Thermal Processing || [[Sam Azadi | Sam Azadi]]
 +
|-
 +
| Rapid Thermal Annealer (RTA) - Si || RTA-01 || Thermal Processing || [[Lucas Barreto | Lucas Barreto]]
 
|-
 
|-
−
| Brewer Spinner - SU-8/PDMS || SPN-07 || Soft Lithography || [[Ana Cohen | Ana Cohen]]
+
| Rapid Thermal Annealer (RTA) - General  || RTA-02 || Thermal Processing || [[Lucas Barreto | Lucas Barreto]]
 
|-
 
|-
−
| Apogee Spinner - Positive Resist (Left) - No LOR/PMGI/Polyimide || SPN-01 || Spinners || [[Ana Cohen | Ana Cohen]]
+
| Tousimis Critical Point Dryer || CPD-01 || Wet Processing || [[Travis Venables | Travis Venables]]
 
|-
 
|-
−
| Apogee Spinner - Positive Resist (Right) || SPN-03 || Spinners || [[Ana Cohen | Ana Cohen]]
+
| Spin Rinse Dryer || SRD-01 || Wet Processing || [[Kyle_Keenan | Kyle Keenan]]
 
|-
 
|-
−
| ReynoldsTech Spinner - Negative Resist || SPN-04 || Spinners || [[Ana Cohen | Ana Cohen]]
+
| Hydrofluoric (HF) Acid Bench || WB-06 || Wet Processing || [[Ana Cohen | Ana Cohen]]
 
|-
 
|-
−
| Apogee Spinner - E-Beam Resist Only - No LOR/PMGI/Polyimide || SPN-06 || Spinners || [[Ana Cohen | Ana Cohen]]
+
| Sonicator - Bay 3 || WB-09 || Wet Processing || [[Kyle_Keenan | Kyle Keenan]]
 
|-
 
|-
−
| Spin Rinse Dryer || SRD-01 || Wet Bench || [[Kyle_Keenan | Kyle Keenan]]
+
| Sonicator - Bay 2 || WB-11 || Wet Processing || [[Kyle_Keenan | Kyle Keenan]]
 
|-
 
|-
−
| Hydrofluoric (HF) Acid Process || WB-06 || Wet Bench || [[Ana Cohen | Ana Cohen]]
+
| RCA Clean Bench || WB-14 || Wet Processing || [[Ana Cohen | Ana Cohen]]
 
|}
 
|}

Latest revision as of 10:14, 13 August 2024

Tool Name Tool ID Tool Group Owner
EVG 510 Wafer Bonder BE-01 Backend Eric Johnston
EVG 620 Wafer Bond Aligner BE-02 Backend Eric Johnston
K&S Wire Bonder BE-03 Backend Eric Johnston
ADT 7100 Dicing Saw BE-04 Backend Travis Venables
TPT Wire Bonder BE-06 Backend Eric Johnston
Brewer Spinner (White Light) SPN-07 Backend Ana Cohen
Cambridge Nanotech S200 ALD ALD-01 Deposition Sam Azadi
Ultratech Fiji G2 ALD ALD-02 Deposition Lucas Barreto
Veeco Savannah 200 ALD-03 Deposition Sam Azadi
Oxford PlasmaLab 100 PECVD CVD-01 Deposition Sam Azadi
SMI MOCVD, Horizontal Reactor CVD-04 H Deposition Faculty Managed
SMI MOCVD, Vertical Reactor CVD-04 V Deposition Faculty Managed
Lesker Nano-36 Thermal Evaporator PVD-01 Deposition David Barth
Lesker PVD75 E-Beam/Thermal Evaporator PVD-02 Deposition David Barth
Lesker PVD75 DC/RF Sputterer PVD-03 Deposition Dan Sabrsula
Lesker PVD75 E-beam Evaporator PVD-04 Deposition Dan Sabrsula
Denton Explorer14 Magnetron Sputterer PVD-05 Deposition Dan Sabrsula
Evatec Clusterline 200 II PVD-06 Deposition Faculty Managed
Intlvac E-beam Evaporator PVD-09 Deposition Dan Sabrsula
Intlvac IBE Ion Mill DE-01 Dry Etch Sam Azadi
Anatech SCE-108 Barrel Asher DE-02 Dry Etch Ana Cohen
SPTS Si DRIE DE-03 Dry Etch Sam Azadi
Oxford 80 Plus RIE DE-04 Dry Etch Sam Azadi
Oxford Cobra ICP Etcher DE-05 Dry Etch Sam Azadi
SPTS/Xactix XeF2 Isotropic Etcher DE-06 Dry Etch Sam Azadi
Jupiter II RIE Plasma Etcher DE-08 Dry Etch Lucas Barreto
Zeiss Smartzoom5 2D/3D Optical Microscope MET-10 Inspection David Barth
Zeiss Axio Imager M2m Microscope (1 of 4) MET-12 Inspection Kyle Keenan
Zeiss Axio Imager M2m Microscope (2 of 4) MET-13 Inspection Kyle Keenan
Zeiss Axio Imager M2m Microscope (3 of 4) MET-14 Inspection Kyle Keenan
Zeiss Axio Imager M2m Microscope (4 of 4) MET-15 Inspection Kyle Keenan
IPG IX-255 Excimer Laser Micromachining LMM-01 Laser Micromachining Eric Johnston
IPG IX280-DXF Green Laser Micromachining LMM-02 Laser Micromachining Ana Cohen
Elionix ELS-7500EX E-Beam Lithography System EBL-01 Lithography David Barth
Litho Workstation for BEAMER and TRACER EBL-02 Lithography David Barth
Raith EBPG5200+ E-Beam Lithography System EBL-03 Lithography David Barth
Heidelberg DWL 66+ Laser Writer LW-01 Lithography Ana Cohen
Nanoscribe Photonic Professional GT LW-02 Lithography Ana Cohen
SUSS MicroTec MA6 Gen3 Mask Aligner MA-01 Lithography Ana Cohen
Nanonex NX2600 Nanoimprint/Mask Aligner MA-02 Lithography David Barth
Hawks/Genesis HMDS Vapor Prime Oven OVN-01 Lithography Kyle Keenan
KLA Tencor P7 2D profilometer MET-01 Metrology David Barth
KLA Tencor P7 2D&3D/stress profilometer MET-02 Metrology David Barth
Filmetrics F50 (yellow light) MET-03 Metrology David Barth
Filmetrics F40 MET-04 Metrology David Barth
Filmetrics Profilm3D Optical Profilometer MET-05 Metrology David Barth
Woollam V-VASE Ellipsometer MET-06 Metrology Lucas Barreto
Jandel Multi Height Four Point Probe MET-08 Metrology Sam Azadi
Micromanipulator 4060 Probe Station MET-09 Metrology Dan Sabrsula
Filmetrics F50 (White Light) MET-11 Metrology David Barth
SUSS MicroTec AS8 AltaSpray RC-01 Resist Coating Ana Cohen
CEE Apogee Spinner - Acetone Soluble Resist SPN-01 Resist Coating Ana Cohen
CEE Apogee Spinner - LOR/PMGI/Polyimide SPN-03 Resist Coating Ana Cohen
ReynoldsTech Spinner - Negative Resist SPN-04 Resist Coating Ana Cohen
Apogee Spinner - E-Beam SPN-06 Resist Coating Ana Cohen
CEE Apogee Spinner - Negative Epoxy Resist SPN-08 Soft Lithography Ana Cohen
CEE Apogee Spinner - PDMS SPN-09 Soft Lithography Ana Cohen
Anatech SCE-106 Barrel Asher DE-07 Soft Lithography Ana Cohen
ABM3000HR Mask Aligner MA-03 Soft Lithography Ana Cohen
SCS PDS2010 Parylene Coater PVD-07 Soft Lithography Kyle Keenan
Silanization Dessicator PVD-08 Soft Lithography Ana Cohen
MRL Wet/Dry Thermal Oxide CVD-02 A Thermal Processing Sam Azadi
MRL LPCVD Silicon Nitride CVD-02 B Thermal Processing Sam Azadi
MRL Anneal 1 CVD-02 C Thermal Processing Sam Azadi
MRL Anneal 2 CVD-02 D Thermal Processing Sam Azadi
Rapid Thermal Annealer (RTA) - Si RTA-01 Thermal Processing Lucas Barreto
Rapid Thermal Annealer (RTA) - General RTA-02 Thermal Processing Lucas Barreto
Tousimis Critical Point Dryer CPD-01 Wet Processing Travis Venables
Spin Rinse Dryer SRD-01 Wet Processing Kyle Keenan
Hydrofluoric (HF) Acid Bench WB-06 Wet Processing Ana Cohen
Sonicator - Bay 3 WB-09 Wet Processing Kyle Keenan
Sonicator - Bay 2 WB-11 Wet Processing Kyle Keenan
RCA Clean Bench WB-14 Wet Processing Ana Cohen
Retrieved from "https://wiki.nano.upenn.edu/wiki/index.php?title=QNF_Equipment_Owner_Matrix&oldid=1927"