Difference between revisions of "Oxford Cobra ICP Etcher"
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| Instrument_Type = Etch | | Instrument_Type = Etch | ||
| − | | Staff_Manager = [[ | + | | Staff_Manager = [[Lucas Barreto | Lucas Barreto]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = Oxford Instruments | | Tool_Manufacturer = Oxford Instruments | ||
Latest revision as of 14:15, 31 March 2025
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| Tool Name | Oxford Cobra ICP Etcher |
|---|---|
| Instrument Type | Etch |
| Staff Manager | Lucas Barreto |
| Lab Location | Bay 2 |
| Tool Manufacturer | Oxford Instruments |
| Tool Model | Cobra PlasmaPro 100 |
| NEMO Designation | DE-05 |
| Lab Phone | 215-898-9748 |
| SOP Link | SOP |
Description
Oxford PlasmaPro 100 is an inductively coupled plasma (ICP) etcher. The tool uses an RF magnetic field to induce an RF electric field and energize the electrons that result in the ionization of gas molecules and atoms at low pressures.
- Max ICP power: 3 kW
- Max RF power: 200 W
The tool is connected to the following gases: BCl3, Cl2, Ar, O2, SF6, CF4, and CHF3.
Applications
- Etch of Si
- Etch of SiO2
- Etch of SiNx
- Etch of InP
- Etch of Al, Cr, Ti, Nb, hafnia, alumina ....
- for a complete list of materials etched in the tool please refer to the SOP at the bottom off this page
NOTE: Au and Ag, Se, and Li compounds are NOT ALLOWED in the system