Difference between revisions of "Nanonex NX2600 Nanoimprint"
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| Instrument_Type = Deposition | | Instrument_Type = Deposition | ||
| Staff_Manager = [[David Barth | David Barth]] | | Staff_Manager = [[David Barth | David Barth]] | ||
| − | | Lab_Location = Bay | + | | Lab_Location = Bay 5 |
| Tool_Manufacturer = Nanonex | | Tool_Manufacturer = Nanonex | ||
| Tool_Model = NX-2600 | | Tool_Model = NX-2600 | ||
| − | | | + | | NEMO_Designation = MA-02 |
| Lab_Phone = XXXXX | | Lab_Phone = XXXXX | ||
| SOP Link = [https://www.seas.upenn.edu/~nanosop/NX2600_SOP.htm SOP] | | SOP Link = [https://www.seas.upenn.edu/~nanosop/NX2600_SOP.htm SOP] | ||
Latest revision as of 10:43, 28 June 2024
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| Tool Name | Nanonex NX2600 Nanoimprint |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 5 |
| Tool Manufacturer | Nanonex |
| Tool Model | NX-2600 |
| NEMO Designation | MA-02 |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template features into spin-coated resist on a range of substrates. The instrument is capable of thermal embossing (T-NIL) using thermoplastic polymers, as well as UV-assisted embossing (UV-NIL) using UV curable polymers. The NX-2600 utilizes Air Cushion Press (ACP) technology that provides excellent uniformity of the pattern transfer.
Applications
- Thermal nanoimprint lithography
- UV nanoimprint lithography