Difference between revisions of "Process Resources"
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* [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] | * [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation] | ||
| − | = | + | = Lithography = |
* [[Resists at QNF]] | * [[Resists at QNF]] | ||
| + | * [[Developers at QNF]] -- Under Construction | ||
| + | * [[Ancillary Process Chemicals at QNF]] -- Under Construction | ||
| + | * [[How to Make a Mask]] -- Under Construction | ||
= Film Characterization= | = Film Characterization= | ||
Latest revision as of 14:48, 17 June 2024
General Process Documents
Lithography
- Resists at QNF
- Developers at QNF -- Under Construction
- Ancillary Process Chemicals at QNF -- Under Construction
- How to Make a Mask -- Under Construction
Film Characterization
- Deposition and Etch Characterization of LPCVD SiNx thin films
- ALD deposition of SiO2 using BDEAS and Ozone precursors