Difference between revisions of "Ti master recipe"
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| − | > [[Denton_Explorer14_Magnetron_Sputterer | Click here to return to PVD-05]] < | + | > [[Denton_Explorer14_Magnetron_Sputterer#Process_data_&_master_recipes | Click here to return to PVD-05]] < |
Step T004 is the deposition step and step T005 is the cool-down step (60 s). | Step T004 is the deposition step and step T005 is the cool-down step (60 s). | ||
Latest revision as of 14:03, 30 January 2023
> Click here to return to PVD-05 <
Step T004 is the deposition step and step T005 is the cool-down step (60 s).
| Step Number | T000 | T001 | T002 | T003 | T004 | T005 | T006 |
|---|---|---|---|---|---|---|---|
| Step Time (sec) | 5 | 120 | 60 | 60 | [dep] | 60 | 5 |
| Min Vacuum Setpoint (Torr) | |||||||
| Gas - (PID or Fixed) | PID | PID | PID | PID | |||
| Gas - PID Master Gas Select | 1 | 1 | 1 | 1 | |||
| Gas1 - Setpoint (sccm) | 10 | 10 | 10 | 10 | |||
| Gas2 - Setpoint (sccm) | |||||||
| Gas PID Pressure (mTorr) | 10 | 5 | 3 | 3 | |||
| RF Source - Sputter (Watts) | |||||||
| RF Source - Cathode Select | |||||||
| RF Source - Shutter | |||||||
| DC 1 Source - Sputter (Watts) | 100 | 200 | 300 | 350 | |||
| DC 1 Source - Cathode Select | 2 | 2 | 2 | 2 | |||
| DC 1 Source - Shutter | Open | ||||||
| DC 2 Source - Sputter (Watts) | |||||||
| DC 2 Source - Shutter | |||||||
| Pressure Control (Throttle) | Yes | Yes | Yes | Yes | Yes | ||
| Ignition Pressure (mTorr) | |||||||
| Rotation Speed (0-100%) | 50 | 50 | 50 | 50 | 50 | ||
| End Process (Yes) | Yes |