Ti master recipe

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Step T004 is the deposition step and step T005 is the cool-down step (60 s).

Step Number T000 T001 T002 T003 T004 T005 T006
Step Time (sec) 5 120 60 60 [dep] 60 5
Min Vacuum Setpoint (Torr)
Gas - (PID or Fixed) PID PID PID PID
Gas - PID Master Gas Select 1 1 1 1
Gas1 - Setpoint (sccm) 10 10 10 10
Gas2 - Setpoint (sccm)
Gas PID Pressure (mTorr) 10 5 3 3
RF Source - Sputter (Watts)
RF Source - Cathode Select
RF Source - Shutter
DC 1 Source - Sputter (Watts) 100 200 300 350
DC 1 Source - Cathode Select 2 2 2 2
DC 1 Source - Shutter Open
DC 2 Source - Sputter (Watts)
DC 2 Source - Shutter
Pressure Control (Throttle) Yes Yes Yes Yes Yes
Ignition Pressure (mTorr)
Rotation Speed (0-100%) 50 50 50 50 50
End Process (Yes) Yes