Difference between revisions of "Lesker PVD75 E-beam Evaporator"
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| image = [[Image:PVD-04.jpeg|300px]] | | image = [[Image:PVD-04.jpeg|300px]] | ||
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| − | | Instrument_Type = | + | | Instrument_Type = Physical vapor deposition |
| Staff_Manager = [[Jason_A._Röhr | Jason]] (jarohr@seas.upenn.edu) | | Staff_Manager = [[Jason_A._Röhr | Jason]] (jarohr@seas.upenn.edu) | ||
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
Revision as of 08:44, 14 September 2022
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| Tool Name | Lesker PVD75 E-Beam/Thermal Evaporator |
|---|---|
| Instrument Type | Physical vapor deposition |
| Staff Manager | Jason (jarohr@seas.upenn.edu) |
| Lab Location | Bay 2 |
| Tool Manufacturer | Kurt J. Lesker |
| Tool Model | PVD75 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | 8-9748 |
| SOP Link | SOP |
Description
The tool
The Kurt J. Lesker PVD75 E-beam Evaporator is an electron-beam (e-beam) evaporation tool. The tool is a fully automated system for depositing Ti, Cr, Au, and/or Pd via e-beam evaporation. The tool also comes with a load-lock system, allowing for fast and easy transfer of samples in and out of the system.
Available materials
The tool contains the following materials:
- Au - Gold
- Cr - Chromium
- Pd - Palladium
- Ti - Titanium
Deposition is limited to thin-film thicknesses of ~100 nm.
Resources
Training video
Link: PVD-4 Training Video
SOPs & Troubleshooting
Link: QNF SOP