Difference between revisions of "Tousimis Critical Point Dryer"
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(Created page with "Category:Back End {{EquipmentInfo | name = Tousimis Critical Point Dryer | Tool_Name = Tousimis Critical Point Dryer | image = 300px | imagecaption...") |
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| − | [[Category: | + | [[Category:Wet Processing]][[Category:Equipment]] |
{{EquipmentInfo | {{EquipmentInfo | ||
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| image = [[Image:CPD-01.jpeg|300px]] | | image = [[Image:CPD-01.jpeg|300px]] | ||
| imagecaption = | | imagecaption = | ||
| − | | Instrument_Type = | + | | Instrument_Type = Wet Processing |
| − | | Staff_Manager = | + | | Staff_Manager = [[Travis Venables | Travis Venables]] |
| − | | Lab_Location = Bay | + | | Lab_Location = Bay 3 |
| Tool_Manufacturer = Tousimis | | Tool_Manufacturer = Tousimis | ||
| Tool_Model = 931-C | | Tool_Model = 931-C | ||
| − | | | + | | NEMO_Designation = CPD-01 |
| Lab_Phone = XXXXX | | Lab_Phone = XXXXX | ||
| SOP Link = [https://www.seas.upenn.edu/~nanosop/CriticalPointDryer.htm SOP] | | SOP Link = [https://www.seas.upenn.edu/~nanosop/CriticalPointDryer.htm SOP] | ||
Latest revision as of 12:55, 28 July 2025
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| Tool Name | Tousimis Critical Point Dryer |
|---|---|
| Instrument Type | Wet Processing |
| Staff Manager | Travis Venables |
| Lab Location | Bay 3 |
| Tool Manufacturer | Tousimis |
| Tool Model | 931-C |
| NEMO Designation | CPD-01 |
| Nearest Phone | XXXXX |
| SOP Link | SOP |
Description
The system enables drying of delicate samples through the use of liquid carbon dioxide as a transitional fluid which has zero surface tension at the critical point (1072 psi at 31 C). The tool can process pieces up to several 100 mm substrates.
Applications
- Carbon dioxide (CO2) drying after release of bulk or surface micromachined devices