Difference between revisions of "QNF Equipment Owner Matrix"
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| ADT 7100 Dicing Saw || BE-04 || Backend || [[Travis Venables | Travis Venables]] | | ADT 7100 Dicing Saw || BE-04 || Backend || [[Travis Venables | Travis Venables]] | ||
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− | |||
|- | |- | ||
| TPT Wire Bonder || BE-06 || Backend || [[Eric_Johnston | Eric Johnston]] | | TPT Wire Bonder || BE-06 || Backend || [[Eric_Johnston | Eric Johnston]] | ||
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| Cambridge Nanotech S200 ALD || ALD-01 || Deposition || [[Sam Azadi | Sam Azadi]] | | Cambridge Nanotech S200 ALD || ALD-01 || Deposition || [[Sam Azadi | Sam Azadi]] | ||
− | |||
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|- | |- | ||
| Veeco Savannah 200 || ALD-03 || Deposition || [[Sam Azadi | Sam Azadi]] | | Veeco Savannah 200 || ALD-03 || Deposition || [[Sam Azadi | Sam Azadi]] | ||
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| Intlvac E-beam Evaporator || PVD-09 || Deposition || [[Dan Sabrsula | Dan Sabrsula]] | | Intlvac E-beam Evaporator || PVD-09 || Deposition || [[Dan Sabrsula | Dan Sabrsula]] | ||
|- | |- | ||
− | | Intlvac IBE Ion Mill || DE-01 || Dry Etch || [[ | + | | Intlvac IBE Ion Mill || DE-01 || Dry Etch || [[David_Barth | David Barth]] |
|- | |- | ||
| Anatech SCE-108 Barrel Asher || DE-02 || Dry Etch || [[Ana Cohen | Ana Cohen]] | | Anatech SCE-108 Barrel Asher || DE-02 || Dry Etch || [[Ana Cohen | Ana Cohen]] | ||
|- | |- | ||
− | | SPTS Si DRIE || DE-03 || Dry Etch || [[ | + | | SPTS Si DRIE || DE-03 || Dry Etch || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
− | | Oxford 80 Plus RIE || DE-04 || Dry Etch || [[ | + | | Oxford 80 Plus RIE || DE-04 || Dry Etch || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
− | | Oxford Cobra ICP Etcher || DE-05 || Dry Etch || [[ | + | | Oxford Cobra ICP Etcher || DE-05 || Dry Etch || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
− | | SPTS/Xactix XeF2 Isotropic Etcher || DE-06 || Dry Etch || [[ | + | | SPTS/Xactix XeF2 Isotropic Etcher || DE-06 || Dry Etch || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
| Jupiter II RIE Plasma Etcher || DE-08 || Dry Etch || [[Lucas Barreto | Lucas Barreto]] | | Jupiter II RIE Plasma Etcher || DE-08 || Dry Etch || [[Lucas Barreto | Lucas Barreto]] | ||
|- | |- | ||
− | | Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[ | + | | Zeiss Smartzoom5 2D/3D Optical Microscope || MET-10 || Inspection || [[David_Barth | David Barth]] |
|- | |- | ||
| Zeiss Axio Imager M2m Microscope (1 of 4) || MET-12 || Inspection || [[Kyle Keenan | Kyle Keenan]] | | Zeiss Axio Imager M2m Microscope (1 of 4) || MET-12 || Inspection || [[Kyle Keenan | Kyle Keenan]] | ||
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| IPG IX-255 Excimer Laser Micromachining || LMM-01 || Laser Micromachining || [[Eric_Johnston | Eric Johnston]] | | IPG IX-255 Excimer Laser Micromachining || LMM-01 || Laser Micromachining || [[Eric_Johnston | Eric Johnston]] | ||
|- | |- | ||
− | | IPG IX280-DXF Green Laser Micromachining || LMM-02 || Laser Micromachining || [[ | + | | IPG IX280-DXF Green Laser Micromachining || LMM-02 || Laser Micromachining || [[Eric_Johnston | Eric Johnston]] |
|- | |- | ||
| Elionix ELS-7500EX E-Beam Lithography System || EBL-01 || Lithography || [[David_Barth | David Barth]] | | Elionix ELS-7500EX E-Beam Lithography System || EBL-01 || Lithography || [[David_Barth | David Barth]] | ||
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| Woollam V-VASE Ellipsometer || MET-06 || Metrology || [[Lucas Barreto | Lucas Barreto]] | | Woollam V-VASE Ellipsometer || MET-06 || Metrology || [[Lucas Barreto | Lucas Barreto]] | ||
|- | |- | ||
− | | Jandel Multi Height Four Point Probe || MET-08 || Metrology || [[ | + | | Jandel Multi Height Four Point Probe || MET-08 || Metrology || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
| Micromanipulator 4060 Probe Station || MET-09 || Metrology || [[Dan Sabrsula | Dan Sabrsula]] | | Micromanipulator 4060 Probe Station || MET-09 || Metrology || [[Dan Sabrsula | Dan Sabrsula]] | ||
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| Silanization Dessicator || PVD-08 || Soft Lithography || [[Ana Cohen | Ana Cohen]] | | Silanization Dessicator || PVD-08 || Soft Lithography || [[Ana Cohen | Ana Cohen]] | ||
|- | |- | ||
− | | MRL Wet/Dry Thermal Oxide || CVD-02 A || Thermal Processing || [[ | + | | MRL Wet/Dry Thermal Oxide || CVD-02 A || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
− | | MRL LPCVD Silicon Nitride || CVD-02 B || Thermal Processing || [[ | + | | MRL LPCVD Silicon Nitride || CVD-02 B || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
− | | MRL Anneal 1 || CVD-02 C || Thermal Processing || [[ | + | | MRL Anneal 1 || CVD-02 C || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
− | | MRL Anneal 2 || CVD-02 D || Thermal Processing || [[ | + | | MRL Anneal 2 || CVD-02 D || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] |
|- | |- | ||
| Rapid Thermal Annealer (RTA) - Si || RTA-01 || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] | | Rapid Thermal Annealer (RTA) - Si || RTA-01 || Thermal Processing || [[Lucas Barreto | Lucas Barreto]] |
Latest revision as of 14:10, 31 March 2025
Tool Name | Tool ID | Tool Group | Owner |
---|---|---|---|
EVG 510 Wafer Bonder | BE-01 | Backend | Eric Johnston |
EVG 620 Wafer Bond Aligner | BE-02 | Backend | Eric Johnston |
K&S Wire Bonder | BE-03 | Backend | Eric Johnston |
ADT 7100 Dicing Saw | BE-04 | Backend | Travis Venables |
TPT Wire Bonder | BE-06 | Backend | Eric Johnston |
Brewer Spinner (White Light) | SPN-07 | Backend | Ana Cohen |
Cambridge Nanotech S200 ALD | ALD-01 | Deposition | Sam Azadi |
Veeco Savannah 200 | ALD-03 | Deposition | Sam Azadi |
Oxford PlasmaLab 100 PECVD | CVD-01 | Deposition | Sam Azadi |
SMI MOCVD, Horizontal Reactor | CVD-04 H | Deposition | Faculty Managed |
SMI MOCVD, Vertical Reactor | CVD-04 V | Deposition | Faculty Managed |
Lesker Nano-36 Thermal Evaporator | PVD-01 | Deposition | David Barth |
Lesker PVD75 E-Beam/Thermal Evaporator | PVD-02 | Deposition | David Barth |
Lesker PVD75 DC/RF Sputterer | PVD-03 | Deposition | Dan Sabrsula |
Lesker PVD75 E-beam Evaporator | PVD-04 | Deposition | Dan Sabrsula |
Denton Explorer14 Magnetron Sputterer | PVD-05 | Deposition | Dan Sabrsula |
Evatec Clusterline 200 II | PVD-06 | Deposition | Faculty Managed |
Intlvac E-beam Evaporator | PVD-09 | Deposition | Dan Sabrsula |
Intlvac IBE Ion Mill | DE-01 | Dry Etch | David Barth |
Anatech SCE-108 Barrel Asher | DE-02 | Dry Etch | Ana Cohen |
SPTS Si DRIE | DE-03 | Dry Etch | Lucas Barreto |
Oxford 80 Plus RIE | DE-04 | Dry Etch | Lucas Barreto |
Oxford Cobra ICP Etcher | DE-05 | Dry Etch | Lucas Barreto |
SPTS/Xactix XeF2 Isotropic Etcher | DE-06 | Dry Etch | Lucas Barreto |
Jupiter II RIE Plasma Etcher | DE-08 | Dry Etch | Lucas Barreto |
Zeiss Smartzoom5 2D/3D Optical Microscope | MET-10 | Inspection | David Barth |
Zeiss Axio Imager M2m Microscope (1 of 4) | MET-12 | Inspection | Kyle Keenan |
Zeiss Axio Imager M2m Microscope (2 of 4) | MET-13 | Inspection | Kyle Keenan |
Zeiss Axio Imager M2m Microscope (3 of 4) | MET-14 | Inspection | Kyle Keenan |
Zeiss Axio Imager M2m Microscope (4 of 4) | MET-15 | Inspection | Kyle Keenan |
IPG IX-255 Excimer Laser Micromachining | LMM-01 | Laser Micromachining | Eric Johnston |
IPG IX280-DXF Green Laser Micromachining | LMM-02 | Laser Micromachining | Eric Johnston |
Elionix ELS-7500EX E-Beam Lithography System | EBL-01 | Lithography | David Barth |
Litho Workstation for BEAMER and TRACER | EBL-02 | Lithography | David Barth |
Raith EBPG5200+ E-Beam Lithography System | EBL-03 | Lithography | David Barth |
Heidelberg DWL 66+ Laser Writer | LW-01 | Lithography | Ana Cohen |
Nanoscribe Photonic Professional GT | LW-02 | Lithography | Ana Cohen |
SUSS MicroTec MA6 Gen3 Mask Aligner | MA-01 | Lithography | Ana Cohen |
Nanonex NX2600 Nanoimprint/Mask Aligner | MA-02 | Lithography | David Barth |
Hawks/Genesis HMDS Vapor Prime Oven | OVN-01 | Lithography | Kyle Keenan |
KLA Tencor P7 2D profilometer | MET-01 | Metrology | David Barth |
KLA Tencor P7 2D&3D/stress profilometer | MET-02 | Metrology | David Barth |
Filmetrics F50 (yellow light) | MET-03 | Metrology | David Barth |
Filmetrics F40 | MET-04 | Metrology | David Barth |
Filmetrics Profilm3D Optical Profilometer | MET-05 | Metrology | David Barth |
Woollam V-VASE Ellipsometer | MET-06 | Metrology | Lucas Barreto |
Jandel Multi Height Four Point Probe | MET-08 | Metrology | Lucas Barreto |
Micromanipulator 4060 Probe Station | MET-09 | Metrology | Dan Sabrsula |
Filmetrics F50 (White Light) | MET-11 | Metrology | David Barth |
SUSS MicroTec AS8 AltaSpray | RC-01 | Resist Coating | Ana Cohen |
CEE Apogee Spinner - Acetone Soluble Resist | SPN-01 | Resist Coating | Ana Cohen |
CEE Apogee Spinner - LOR/PMGI/Polyimide | SPN-03 | Resist Coating | Ana Cohen |
ReynoldsTech Spinner - Negative Resist | SPN-04 | Resist Coating | Ana Cohen |
Apogee Spinner - E-Beam | SPN-06 | Resist Coating | Ana Cohen |
CEE Apogee Spinner - Negative Epoxy Resist | SPN-08 | Soft Lithography | Ana Cohen |
CEE Apogee Spinner - PDMS | SPN-09 | Soft Lithography | Ana Cohen |
Anatech SCE-106 Barrel Asher | DE-07 | Soft Lithography | Ana Cohen |
ABM3000HR Mask Aligner | MA-03 | Soft Lithography | Ana Cohen |
SCS PDS2010 Parylene Coater | PVD-07 | Soft Lithography | Kyle Keenan |
Silanization Dessicator | PVD-08 | Soft Lithography | Ana Cohen |
MRL Wet/Dry Thermal Oxide | CVD-02 A | Thermal Processing | Lucas Barreto |
MRL LPCVD Silicon Nitride | CVD-02 B | Thermal Processing | Lucas Barreto |
MRL Anneal 1 | CVD-02 C | Thermal Processing | Lucas Barreto |
MRL Anneal 2 | CVD-02 D | Thermal Processing | Lucas Barreto |
Rapid Thermal Annealer (RTA) - Si | RTA-01 | Thermal Processing | Lucas Barreto |
Rapid Thermal Annealer (RTA) - General | RTA-02 | Thermal Processing | Lucas Barreto |
Tousimis Critical Point Dryer | CPD-01 | Wet Processing | Travis Venables |
Spin Rinse Dryer | SRD-01 | Wet Processing | Kyle Keenan |
Hydrofluoric (HF) Acid Bench | WB-06 | Wet Processing | Ana Cohen |
Sonicator - Bay 3 | WB-09 | Wet Processing | Kyle Keenan |
Sonicator - Bay 2 | WB-11 | Wet Processing | Kyle Keenan |
RCA Clean Bench | WB-14 | Wet Processing | Ana Cohen |