Difference between revisions of "Tousimis Critical Point Dryer"

From Quattrone Nanofabrication Facility
Jump to navigation Jump to search
m (Protected "Tousimis Critical Point Dryer" ([Edit=Allow only administrators] (indefinite) [Move=Allow only administrators] (indefinite)) [cascading])
 
(2 intermediate revisions by 2 users not shown)
Line 7: Line 7:
 
| imagecaption =  
 
| imagecaption =  
 
| Instrument_Type = Back End
 
| Instrument_Type = Back End
| Staff_Manager = David Jones
+
| Staff_Manager = [[Kyle Keenan | Kyle Keenan]]
| Lab_Location = Bay 2
+
| Lab_Location = Bay 3
 
| Tool_Manufacturer = Tousimis
 
| Tool_Manufacturer = Tousimis
 
| Tool_Model = 931-C
 
| Tool_Model = 931-C
| Iris_Designation = CPD-01
+
| NEMO_Designation = CPD-01
 
| Lab_Phone = XXXXX
 
| Lab_Phone = XXXXX
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/CriticalPointDryer.htm SOP]
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/CriticalPointDryer.htm SOP]

Latest revision as of 10:46, 28 June 2024


Tousimis Critical Point Dryer
CPD-01.jpeg
Tool Name Tousimis Critical Point Dryer
Instrument Type Back End
Staff Manager Kyle Keenan
Lab Location Bay 3
Tool Manufacturer Tousimis
Tool Model 931-C
NEMO Designation CPD-01
Lab Phone XXXXX
SOP Link SOP

Description

The system enables drying of delicate samples through the use of liquid carbon dioxide as a transitional fluid which has zero surface tension at the critical point (1072 psi at 31 C). The tool can process pieces up to several 100 mm substrates.

Applications
  • Carbon dioxide (CO2) drying after release of bulk or surface micromachined devices


Resources

SOPs & Troubleshooting