Difference between revisions of "Litho Workstation for BEAMER and TRACER"

**GenIsys BEAMER & TRACER Software**
Tool Name	GenIsys BEAMER & TRACER Software
Instrument Type	Lithography
Staff Manager	David Barth
Lab Location	Cleanroom Corridor
Tool Manufacturer	GenIsys
Tool Model	BEAMER / TRACER
NEMO Designation	EBL-02
Lab Phone	XXXXX
SOP Link

Latest revision as of 10:42, 28 June 2024

Description

Pattern data for electron beam (e-beam), mask aligner and laser lithography is prepared using a software packages called BEAMER and TRACER by GenISys. The software package offers advanced data preparation, 2D and 3D proximity effect correction (PEC), process modeling and simulation for direct write applications in both e-beam and laser lithography.

Applications

E-beam lithography data preparation
Laser lithography data preparation

Resources

SOPs & Troubleshooting

Online Webinars and Training Materials

@@ Line 7: / Line 7: @@
 | imagecaption =
 | Instrument_Type = Lithography
-| Staff_Manager = David Barth
+| Staff_Manager = [[David Barth | David Barth]]
-| Lab_Location = Bay 2
+| Lab_Location = Cleanroom Corridor
 | Tool_Manufacturer = GenIsys
 | Tool_Model = BEAMER / TRACER
-| Iris_Designation = EBL-02
+| NEMO_Designation = EBL-02
 | Lab_Phone = XXXXX
-| SOP Link = [NEED SOP]
+| SOP Link =
 }}
@@ Line 28: / Line 28: @@
 ===== SOPs & Troubleshooting =====
-* [NEED QNF SOP]
+===== Online Webinars and Training Materials =====
+* [https://www.genisys-gmbh.com/webinar-series-beamer-training.html BEAMER Training Webinar]
+* [https://www.genisys-gmbh.com/webinar-series-proximity-effect-in-e-beam-lithography.html Proximity Effect Webinar]
+* [https://www.genisys-gmbh.com/applications.html Application Notes]