Difference between revisions of "Elionix ELS-7500EX E-Beam Lithography System"
Jump to navigation
Jump to search
(update to NEMO) |
(→Allowed Materials: include links to resist page) |
||
| Line 25: | Line 25: | ||
* Standard semiconductor materials | * Standard semiconductor materials | ||
* Low vapor pressure metals | * Low vapor pressure metals | ||
| − | * Resists | + | * Resists |
| + | ** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Standard_e-beam_Resists Standard e-beam resists] | ||
| + | ** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Stockroom_e-beam_Resists Stockroom e-beam resists] | ||
| + | ** [https://wiki.nano.upenn.edu/wiki/index.php?title=Resists_at_QNF#Other_Resists PMGI] | ||
== Resources == | == Resources == | ||
Revision as of 14:17, 17 June 2024
 |
|
| Tool Name | Elionix ELS-7500EX E-Beam Lithography System |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Barth |
| Lab Location | Bay 4 |
| Tool Manufacturer | Elionix |
| Tool Model | ELS-7500EX |
| NEMO Designation | EBL-01 |
| Nearest Phone | 8-9799 |
| SOP Link | SOP |
Description
The Elionix ELS-7500EX is an electron beam lithography tool capable of high resolution patterning at 50 kV with currents from 10 pA to 20 nA.
Applications
- Patterning of positive and negative e-beam resists with features from ~10 nm to micron scale
Allowed Materials
- Standard semiconductor materials
- Low vapor pressure metals
- Resists
Resources
SOPs & Troubleshooting
- SOP
- March 4, 2022: There is a minor issue with the vacuum in the loadlock. The loadlock will not pump down from a partially evacuated state. In order to pump the loadlock if it was not already vented, you must first vent it, and then pump it down again.