Veeco Savannah 200

Creating Veeco Savannah 200

Tool Name	Creating Veeco Savannah 200
Instrument Type	Deposition
Staff Manager	Sam Azadi
Lab Location	Bay 2
Tool Manufacturer	Veeco
Tool Model	Savannah 200
NEMO Designation	{{{NEMO_Designation}}}
Lab Phone	215-898-9736
SOP Link	SOP

Description

Savannah is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than > 2000:1. Savannah is capable of holding substrates of different sizes up to 200mm. The Savannah thin film deposition systems are equipped with Pd, Pt precursors, TMA, HfCl4, BDEAS and Ozone.

Films

• Pt
• Al2O3
• Pd
• SiO2
• Under development: Hafnia (using HfCl4 and O3)

Resources

Most Recent Deposition Rates

Material Name	Precursor 1			Precursor 2			Dep. temperature [C]	Carrier flow [sccm]	Dep. rate [A/cyc]	Date [MM/DD/YY]
	Name	Pulse time [s]	Wait time [s]	Name	Pulse time [s]	Wait time [s]
Al2O3	TMA	0.015	5	O3	0.05	5	200	20	1.1	10/17/22
Pt	MeCpPtMe3	0.6	5	O3	0.05	5	200	20	0.7	10/18/22

Material Name	Precursor 1			Precursor 2			Dep. temperature [C]	Carrier flow [sccm]	Dep. rate [A/cyc]	Date [MM/DD/YY]
	Name	Pulse time [s]	Wait time [s] : Stop Valve closed / open	Name	Pulse time [s]	Wait time [s] : Stop Valve closed / open
SiO2	BDEAS	0.3	5 SV closed/ 8 SV open	O3	0.015	5 SV closed/ 8 SV open	200	20	1.5	04/05/23

-Note that Pt deposition saturates at ~ 10 nm and the deposition rate only applies to thicknesses of ~ 5 - 10nm.

-Thin film sheet resistance of Pt deposited using the process parameters above at ~ 10 nm is: ~ 30 Ohm/Sq

SOPs & Troubleshooting

• QNF SOP
• ALD KOH Cleaning Procedure

Protocols and Reports

• ALD deposition of SiO₂ using BDEAS and Ozone precursors