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20 May 2024
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16:16 | EDS 2 changes history +824 [Bohnn (2×)] | |||
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16:16 (cur | prev) +182 Bohnn talk contribs | ||||
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13:55 (cur | prev) +642 Bohnn talk contribs →Overview | ||||
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N 15:09 | ALD-01: Aluminum Oxide Deposition 10 changes history +464 [Lucasamb (10×)] | |||
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15:09 (cur | prev) 0 Lucasamb talk contribs | ||||
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15:06 (cur | prev) +1 Lucasamb talk contribs | ||||
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15:05 (cur | prev) +14 Lucasamb talk contribs | ||||
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14:58 (cur | prev) +1 Lucasamb talk contribs | ||||
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14:58 (cur | prev) -1 Lucasamb talk contribs | ||||
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14:58 (cur | prev) 0 Lucasamb talk contribs | ||||
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14:58 (cur | prev) -1 Lucasamb talk contribs | ||||
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14:57 (cur | prev) +1 Lucasamb talk contribs | ||||
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14:57 (cur | prev) +221 Lucasamb talk contribs | ||||
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14:26 (cur | prev) +228 Lucasamb talk contribs Created page with "<iframe height="500px" key="google" level="docs" path="https://docs.google.com/spreadsheets/d/e/2PACX-1vRT0Xcfp3506lnri7h04_tPNBdXSckz1XCJizwMky8hWDH0QwxxVHefXI4scbtD66peP2nHN..." | |||
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N 14:45 | SiO2 (silicon dioxide) 12 changes history +2,184 [Dsabr (12×)] | |||
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14:45 (cur | prev) +213 Dsabr talk contribs →Processes | ||||
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14:44 (cur | prev) +89 Dsabr talk contribs →Processes | ||||
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14:34 (cur | prev) +34 Dsabr talk contribs →ALD Master Recipe | ||||
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14:33 (cur | prev) +551 Dsabr talk contribs →Processes | ||||
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14:29 (cur | prev) +383 Dsabr talk contribs →Sputter Deposition Rates | ||||
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14:25 (cur | prev) +68 Dsabr talk contribs →Etching Equipment | ||||
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14:23 (cur | prev) +59 Dsabr talk contribs →Equipment | ||||
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12:04 (cur | prev) +77 Dsabr talk contribs →Deposition Equipment | ||||
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12:02 (cur | prev) +66 Dsabr talk contribs →Deposition Equipment | ||||
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12:01 (cur | prev) +76 Dsabr talk contribs →Equipment | ||||
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12:00 (cur | prev) -84 Dsabr talk contribs →Deposition Equipment | ||||
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12:00 (cur | prev) +652 Dsabr talk contribs Created page with "Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components. ==Equipment== ===..." | |||
| 14:42 | Upload log Dsabr talk contribs uploaded File:Oxford PECVD SiO2 deposition.pdf | ||||
| 14:11 | Cambridge Nanotech S200 ALD diffhist +68 Lucasamb talk contribs →Applications | ||||
| N 12:43 | ToF-SIMS diffhist +593 Bohnn talk contribs Created page with "==Overview== '''Time of Flight Secondary Ion Mass Spectroscopy''' or '''ToF-SIMS''' is an technique performed in a FIB to analyze the composi..." | ||||
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10:53 | Lesker PVD75 DC/RF Sputterer 3 changes history +28 [Dsabr (3×)] | |||
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10:53 (cur | prev) -11 Dsabr talk contribs →Oxides, fluorides & nitrides | ||||
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10:52 (cur | prev) -1 Dsabr talk contribs →Oxides, fluorides & nitrides | ||||
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10:52 (cur | prev) +40 Dsabr talk contribs →Oxides, fluorides & nitrides | ||||
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10:42 | Denton Explorer14 Magnetron Sputterer 2 changes history -10 [Dsabr (2×)] | |||
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10:42 (cur | prev) -7 Dsabr talk contribs →Process data & master recipes | ||||
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10:42 (cur | prev) -3 Dsabr talk contribs →Process data & master recipes | ||||