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20 May 2024
| 14:11 | Cambridge Nanotech S200 ALD diffhist +68 Lucasamb talk contribs →Applications | ||||
| 13:55 | EDS diffhist +642 Bohnn talk contribs →Overview | ||||
| N 12:43 | ToF-SIMS diffhist +593 Bohnn talk contribs Created page with "==Overview== '''Time of Flight Secondary Ion Mass Spectroscopy''' or '''ToF-SIMS''' is an technique performed in a FIB to analyze the composi..." | ||||
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N 12:04 | SiO2 (silicon dioxide) 5 changes history +787 [Dsabr (5×)] | |||
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12:04 (cur | prev) +77 Dsabr talk contribs →Deposition Equipment | ||||
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12:02 (cur | prev) +66 Dsabr talk contribs →Deposition Equipment | ||||
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12:01 (cur | prev) +76 Dsabr talk contribs →Equipment | ||||
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12:00 (cur | prev) -84 Dsabr talk contribs →Deposition Equipment | ||||
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12:00 (cur | prev) +652 Dsabr talk contribs Created page with "Silicon dioxide is an insulating, transparent oxide that is highly unreactive. It is often used as a passivation layer to protect electrical components. ==Equipment== ===..." | |||
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10:53 | Lesker PVD75 DC/RF Sputterer 3 changes history +28 [Dsabr (3×)] | |||
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10:53 (cur | prev) -11 Dsabr talk contribs →Oxides, fluorides & nitrides | ||||
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10:52 (cur | prev) -1 Dsabr talk contribs →Oxides, fluorides & nitrides | ||||
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10:52 (cur | prev) +40 Dsabr talk contribs →Oxides, fluorides & nitrides | ||||
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10:42 | Denton Explorer14 Magnetron Sputterer 2 changes history -10 [Dsabr (2×)] | |||
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10:42 (cur | prev) -7 Dsabr talk contribs →Process data & master recipes | ||||
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10:42 (cur | prev) -3 Dsabr talk contribs →Process data & master recipes | ||||