Difference between revisions of "Ti (titanium)"
Jump to navigation
Jump to search
| Line 7: | Line 7: | ||
===Deposition Equipment=== | ===Deposition Equipment=== | ||
* '''PVD-02:''' [[Lesker PVD75 E-Beam/Thermal Evaporator | Lesker PVD75 E-Beam/Thermal Evaporator]] | * '''PVD-02:''' [[Lesker PVD75 E-Beam/Thermal Evaporator | Lesker PVD75 E-Beam/Thermal Evaporator]] | ||
| + | * '''PVD-03:''' [[Lesker PVD75 DC/RF Sputterer | Lesker PVD75 DC/RF Sputterer]] | ||
* '''PVD-04:''' [[Lesker PVD75 E-beam Evaporator | Lesker PVD75 E-beam Evaporator]] | * '''PVD-04:''' [[Lesker PVD75 E-beam Evaporator | Lesker PVD75 E-beam Evaporator]] | ||
| − | |||
* '''PVD-05:''' [[Denton Explorer14 Magnetron Sputterer | Denton Explorer14 Magnetron Sputterer]] | * '''PVD-05:''' [[Denton Explorer14 Magnetron Sputterer | Denton Explorer14 Magnetron Sputterer]] | ||
Revision as of 13:50, 9 May 2024
Titanium is a transition metal with atomic number 22 and symbol Ti. Titanium has a low density, high strength and is resistant to corrosion by water. It has relatively poor electrical and thermal conduction compared to most metals.
Equipment
Deposition Equipment
- PVD-02: Lesker PVD75 E-Beam/Thermal Evaporator
- PVD-03: Lesker PVD75 DC/RF Sputterer
- PVD-04: Lesker PVD75 E-beam Evaporator
- PVD-05: Denton Explorer14 Magnetron Sputterer
Etching
Application
Processes
Sputter Deposition Rates
| PVD Tool | Cathode 2 (DC; high mag) | Recorded | Cathode 3 (DC) | Recorded | Cathode 4 (DC; high mag) | Recorded | ||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Pressure | Power | Rate | Pressure | Power | Rate | Pressure | Power | Rate | ||||
| PVD-03 | 6 mTorr | 300 W | 1.8 Å s-1 | 5 mTorr | 300 W | 0.98 Å s-1 | 03/06/23 | 6 mTorr | 300 W | 0.8 Å s-1 | ||
| PVD Tool | Cathode 2 (DC) | Recorded | ||
|---|---|---|---|---|
| Pressure | Power | Rate | ||
| PVD-05 | 3 mTorr | 350 W | 2.0 Å s-1 | |