Difference between revisions of "Resists at QNF"

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(Reorganized and updated to include tool compatibility along with composition, developer and remover chemistries)
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=== QNF Supplied Standard Photoresists ===
 
=== QNF Supplied Standard Photoresists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Name (+ Datasheet) !! Tone !! Use !! Composition !! Developer !! Remover !! Alternative Resists
+
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || General || PGMEA || MF-319 (0.24N TMAH) || MP 1165 (NMP) || KL5305
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1805] || + || PGMEA || General || || MF-319 (0.24N TMAH) || MP 1165 (NMP) || KL5305
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || General || PGMEA || MF-319 (0.24N TMAH) || MP 1165 (NMP) || KL5315
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1813] || + || PGMEA || General || || MF-319 (0.24N TMAH) || MP 1165 (NMP) || KL5315
 
|-
 
|-
−
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || General || PGMEA || MF-319 (0.24N TMAH) || MP 1165 (NMP) ||
+
| [https://amolf.nl/wp-content/uploads/2016/09/datasheets_S1800.pdf S1818] || + || PGMEA || General || || MF-319 (0.24N TMAH) || MP 1165 (NMP) ||
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Etch || Ethyl lactate, anisole, n-amyl acetate || 0.24N TMAH || MP 1165 (NMP) || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-3] || + || Ethyl lactate, anisole, n-amyl acetate || Etch ||  || 0.24N TMAH || MP 1165 (NMP) || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Etch || Ethyl lactate, anisole, n-amyl acetate || 0.24N TMAH || MP 1165 (NMP) || KPRO-3, KL6003, AZ3330F
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-4.5] || + || Ethyl lactate, anisole, n-amyl acetate || Etch ||  || 0.24N TMAH || MP 1165 (NMP) || KPRO-3, KL6003, AZ3330F
 
|-
 
|-
−
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Etch || Ethyl lactate, anisole, n-amyl acetate || 0.24N TMAH or 0.26N TMAH || MP 1165 (NMP) || AZ 12XT, AZ P4620
+
| [https://upenn.box.com/s/lpd3ev35603w582la2317tkubb36ylzt SPR 220-7] || + || Ethyl lactate, anisole, n-amyl acetate || Etch ||  || 0.24N TMAH or 0.26N TMAH || MP 1165 (NMP) || AZ 12XT, AZ P4620
 
|-
 
|-
−
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || General, Metal RIE, Plating  || PGMEA || AZ300 (0.26N TMAH) or AZ400K 1:4 (metal ion/ alkaline salts) || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
+
| [https://upenn.box.com/s/xb5pfl6zbb1eynl6oyerrub0lw3xh3n7 AZ 3330F] || + || PGMEA || General, Metal RIE, Plating  || || AZ300 (0.26N TMAH) or AZ400K 1:4 (potassium salts) || || SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
 
|-
 
|-
−
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Etch, General || Cyclohexanone || RD6 (0.24N or 0.26N TMAH) || RR4 (DMSO), Acetone ||  
+
| [https://upenn.box.com/s/lff7qf7wq9cn1ny8bytf0e8d87ddjit0 NR7-3000P] || - || Cyclohexanone || Etch, General || || RD6 (0.24N or 0.26N TMAH) || RR4 (DMSO), Acetone ||  
 
|-
 
|-
−
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || Liftoff || PGMEA || 0.26N TMAH || NMP, DMSO ||
+
|  [https://upenn.box.com/s/1nocyldqmocrqmz1gjcwry8n86m9khtu APOL-LO 3202] || - || PGMEA || Liftoff || || 0.26N TMAH || NMP, DMSO ||
 
|-
 
|-
−
| IP-Dip || - || Nanoscribe, Epoxy || Ethoxylated acrylates || PGMEA, IPA || ||  
+
| IP-Dip || - || Ethoxylated acrylates || Nanoscribe, Epoxy || || PGMEA, IPA || ||  
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Epoxy || Cyclopentanone, gamma butyro lactone || PGMEA || || SU-8 2005
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 2] || - || Cyclopentanone, gamma butyro lactone|| Epoxy ||  || PGMEA || || SU-8 2005
 
|-
 
|-
−
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Epoxy || Cyclopentanone, gamma butyro lactone || PGMEA || || SU-8 2050
+
| [https://upenn.box.com/s/4ilkowm17lowx3aod1pt8fwcrf1a8wvc HARE SQ 50] || - || Cyclopentanone, gamma butyro lactone || Epoxy ||  || PGMEA || || SU-8 2050
 
|}
 
|}
  
 
=== Stockroom Photoresists ===
 
=== Stockroom Photoresists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Resist !! Tone !! Notes !! Alternatives !! Datasheet
+
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| SU-8 2005|| - || Epoxy || HARE SQ 2 || [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd Datasheet]
+
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 2005] || - || Cyclopentanone || Epoxy || || SU-8 Developer (PGMEA) || || HARE SQ 2
 
|-
 
|-
−
| SU-8 2050|| - || Epoxy || HARE SQ 50 || [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu Datasheet]
+
| [https://upenn.box.com/s/s4noknbqlyh8inq3gqycw115b7ufdibu SU-8 2050] || - || Cyclopentanone || Epoxy || || SU-8 Developer (PGMEA) || || HARE SQ 50  
 
|-
 
|-
−
| SU-8 2100|| - || Epoxy || HARE SQ 50 || [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e Datasheet]
+
| [https://upenn.box.com/s/va40gxhk7ghwl8p9hhsyvr0rairc9v1e SU-8 2100] || - || Cyclopentanone || Epoxy || || SU-8 Developer (PGMEA) || || HARE SQ 50
 
|-
 
|-
−
| SU-8 3050|| - || Epoxy || HARE SQ 50 || [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd Datasheet]
+
| [https://upenn.box.com/s/f9oi75p3p84rdtpqq5unp0j1c3mqxjrd SU-8 3050] || - || Cyclopentanone || Epoxy || || SU-8 Developer (PGMEA) || || HARE SQ 50
 
|}
 
|}
  
 
=== Standard e-beam Resists ===
 
=== Standard e-beam Resists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Resist !! Tone !! Notes !! Alternatives !! Datasheet
+
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| 495 PMMA A8|| + || Lower Resolution||  || [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 Datasheet]
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A8] || + || Anisole || Lower Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || MIBK || NMP ||
 
|-
 
|-
−
| 495 PMMA A4|| + || Lower Resolution||  || [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 Datasheet]
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A4] || + || Anisole || Lower Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || MIBK || NMP ||
 
|-
 
|-
−
| 495 PMMA A2|| + || Lower Resolution||  || [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 Datasheet]
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 495 PMMA A2] || + || Anisole || Lower Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || MIBK || NMP ||
 
|-
 
|-
−
| 950 PMMA A4|| + || High Resolution||  || [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 Datasheet]
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A4] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || MIBK || NMP ||
 
|-
 
|-
−
| 950 PMMA A2|| + || High Resolution|| 1000 HARP 0.1 || [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 Datasheet]
+
| [https://upenn.box.com/s/ff9s9dhl52tqagc0vbtflwf64odcwtw7 950 PMMA A2] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || MIBK || NMP || 1000 HARP 0.1
 
|-
 
|-
−
| 1000 HARP 1.3|| + || High Resolution||  || [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm Datasheet]
+
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 1.3] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || MIBK || NMP ||
 
|-
 
|-
−
| 1000 HARP 0.1|| + || High Resolution|| 950 PMMA A2 || [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm Datasheet]
+
| [https://upenn.box.com/s/re1sz5cil83m99yv3ug2p9p8ghk3a3vm 1000 HARP 0.1] || + || Anisole || High Resolution|| [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || MIBK || NMP || 950 PMMA A2
 
|}
 
|}
  
 
=== Stockroom e-beam Resists ===
 
=== Stockroom e-beam Resists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Resist !! Tone !! Notes !! Alternatives !! Datasheet
+
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| ZEP 520A|| + || Thicker formulation ||  || [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt Datasheet]
+
| [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A] || + || Anisole || Thicker formulation || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || Xylenes, n-amyl acetate or MIBK || ||
 
|-
 
|-
−
| ZEP 520A-7|| + || Thinner formulation ||  || [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt Datasheet]
+
| [https://upenn.box.com/s/7ek7ccxq3c8xsp8jhe2lhdoi1e0keamt ZEP 520A-7] || + || Anisole || Thinner formulation ||  [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || Xylenes, n-amyl acetate or MIBK || ||
 
|-
 
|-
−
| H-SiQ 6%|| - || HSQ Equivalent ||  || [https://upenn.box.com/s/bv53alommdr2en6s6byrlm4psxdjohzp Datasheet]
+
| [https://upenn.box.com/s/bv53alommdr2en6s6byrlm4psxdjohzp H-SiQ 6%] || - || MIBK || HSQ Equivalent || [https://wiki.nano.upenn.edu/wiki/index.php?title=Elionix_ELS-7500EX_E-Beam_Lithography_System EBL-01], SPN-06 || 0.24N TMAH or 0.26N TMAH || ||
 
|}
 
|}
  
 
=== Other Resists ===
 
=== Other Resists ===
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Resist !! Tone !! Notes !! Alternatives !! Datasheet
+
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| LOR 3A|| N/A || Liftoff, Non-imaging ||  || [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk Datasheet]
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk LOR 3A] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging ||  || 0.24N TMAH, 0.26N TMAH || EBR PG (ethylene glycol, PGME) ||
 
|-
 
|-
−
| PMGI SF 5S|| N/A || Liftoff, Non-imaging ||  || [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk Datasheet]
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 5S] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging ||  || 0.24N TMAH, 0.26N TMAH || EBR PG (ethylene glycol, PGME) ||
 
|-
 
|-
−
| PMGI SF 2S|| N/A || Liftoff, Non-imaging ||  || [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk Datasheet]
+
| [https://upenn.box.com/s/ugfgv8xix7vda56ddaodqv3za44m6syk PMGI SF 2S] || N/A || Cyclopentanone, PGME || Liftoff, Non-imaging ||  || 0.24N TMAH, 0.26N TMAH || EBR PG (ethylene glycol, PGME) ||
 
|-
 
|-
−
| NXR-1025|| N/A || Stockroom, Nanoimprint resist || || [https://upenn.box.com/s/wmal2jasuw6m9nqjykz6p8i2ijdn61fm Datasheet]
+
| [https://upenn.box.com/s/wmal2jasuw6m9nqjykz6p8i2ijdn61fm NXR-1025] || N/A || || Stockroom, Nanoimprint || || ||
 
|}
 
|}
  
Line 90: Line 90:
  
 
{| class="wikitable sortable"
 
{| class="wikitable sortable"
−
! Resist !! Tone !! Notes !! Alternatives !! Datasheet
+
! Name / Datasheet !! Tone !! Composition !! Use / Thickness !! Tool Compatibility !! Developer !! Remover !! Alternative Resists
 
|-
 
|-
−
| KL5305 || + || General || S1805 || [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv Datasheet]
+
| [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5305] || + || PGMEA || General || || 0.26N TMAH|| NMP, DMSO || S1805
 
|-
 
|-
−
| KL5315 || + || General || S1813 || [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv Datasheet]
+
| [https://upenn.box.com/s/1ixn9uek8d78y16x3auicmso433glmvv KL5315] || + || PGMEA || General || || 0.26N TMAH || NMP, DMSO || S1813
 
|-
 
|-
−
| KL6003 || + ||  || SPR 220-3, SPR 220-4.5 || [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f Datasheet]
+
| [https://upenn.box.com/s/qv98tqy0ark0l7ppmvphdicgs7udst1f KL6003] || + || PGMEA ||  || || 0.26N TMAH || NMP, DMSO || SPR 220-3, SPR 220-4.5
 
|-
 
|-
−
| K-PRO 3 || + || Plating, Etching|| SPR 220-3, SPR 220-4.5|| [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f Datasheet]
+
| [https://upenn.box.com/s/v0hwe0p0u3la1oodz3g45qjw0yl54z7f K-PRO 3] || + || PGMEA || Plating, Etching || || 0.26N TMAH or alkaline salts || NMP, DMSO || SPR 220-3, SPR 220-4.5
 
|-
 
|-
−
| AZ 12XT-20PL-15 || + || CAR (i-line), Plating, Packaging, Deep Etch || SPR 220-7, AZ P4620 || [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 Datasheet]
+
| [https://upenn.box.com/s/dj5l9rrsg0k8g8opdegrylhkgypev9w9 AZ 12XT-20PL-15] || + || PGMEA || CAR (i-line), Plating, Packaging, Deep Etch || || AZ300 (0.26N TMAH) || || SPR 220-7, AZ P4620
 
|-
 
|-
−
| AZ P4620|| + || Thick Resist, Plating, Packaging || SPR 220-7, AZ 12XT-20PL-15 || [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 Datasheet]
+
| [https://upenn.box.com/s/0r8meepoyq0b1jux7ubudcpt70clau48 AZ P4620] || + || PGMEA || Thick Resist, Plating, Packaging || || AZ300 (0.26N TMAH) or AZ400K 1:4 (potassium salts) || || SPR 220-7, AZ 12XT-20PL-15
 
|-
 
|-
−
| ma-N 2403|| - || e-beam/DUV Mix and Match ||  || [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep Datasheet]
+
| [https://upenn.box.com/s/7ywdt8x3fqda3p21l4es7fyd98s0fbep ma-N 2403] || - || || e-beam/DUV Mix and Match ||  || || ||
 
|}
 
|}

Revision as of 15:49, 30 June 2023

The QNF provides a variety of standard resists to meet demands for most applications. Some specialty resists are also sold through the QNF Stockroom. A summary of stocked resists along with some processing information can be found in the table below. Click on the resist name to access the datasheet. Other similar options that may be available in QNF are also listed.

QNF Supplied Standard Photoresists

Name / Datasheet Tone Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
S1805 + PGMEA General MF-319 (0.24N TMAH) MP 1165 (NMP) KL5305
S1813 + PGMEA General MF-319 (0.24N TMAH) MP 1165 (NMP) KL5315
S1818 + PGMEA General MF-319 (0.24N TMAH) MP 1165 (NMP)
SPR 220-3 + Ethyl lactate, anisole, n-amyl acetate Etch 0.24N TMAH MP 1165 (NMP) KPRO-3, KL6003, AZ3330F
SPR 220-4.5 + Ethyl lactate, anisole, n-amyl acetate Etch 0.24N TMAH MP 1165 (NMP) KPRO-3, KL6003, AZ3330F
SPR 220-7 + Ethyl lactate, anisole, n-amyl acetate Etch 0.24N TMAH or 0.26N TMAH MP 1165 (NMP) AZ 12XT, AZ P4620
AZ 3330F + PGMEA General, Metal RIE, Plating AZ300 (0.26N TMAH) or AZ400K 1:4 (potassium salts) SPR 220-3, SPR 220-4.5, K-PRO 3, KL6003
NR7-3000P - Cyclohexanone Etch, General RD6 (0.24N or 0.26N TMAH) RR4 (DMSO), Acetone
APOL-LO 3202 - PGMEA Liftoff 0.26N TMAH NMP, DMSO
IP-Dip - Ethoxylated acrylates Nanoscribe, Epoxy PGMEA, IPA
HARE SQ 2 - Cyclopentanone, gamma butyro lactone Epoxy PGMEA SU-8 2005
HARE SQ 50 - Cyclopentanone, gamma butyro lactone Epoxy PGMEA SU-8 2050

Stockroom Photoresists

Name / Datasheet Tone Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
SU-8 2005 - Cyclopentanone Epoxy SU-8 Developer (PGMEA) HARE SQ 2
SU-8 2050 - Cyclopentanone Epoxy SU-8 Developer (PGMEA) HARE SQ 50
SU-8 2100 - Cyclopentanone Epoxy SU-8 Developer (PGMEA) HARE SQ 50
SU-8 3050 - Cyclopentanone Epoxy SU-8 Developer (PGMEA) HARE SQ 50

Standard e-beam Resists

Name / Datasheet Tone Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
495 PMMA A8 + Anisole Lower Resolution EBL-01, SPN-06 MIBK NMP
495 PMMA A4 + Anisole Lower Resolution EBL-01, SPN-06 MIBK NMP
495 PMMA A2 + Anisole Lower Resolution EBL-01, SPN-06 MIBK NMP
950 PMMA A4 + Anisole High Resolution EBL-01, SPN-06 MIBK NMP
950 PMMA A2 + Anisole High Resolution EBL-01, SPN-06 MIBK NMP 1000 HARP 0.1
1000 HARP 1.3 + Anisole High Resolution EBL-01, SPN-06 MIBK NMP
1000 HARP 0.1 + Anisole High Resolution EBL-01, SPN-06 MIBK NMP 950 PMMA A2

Stockroom e-beam Resists

Name / Datasheet Tone Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
ZEP 520A + Anisole Thicker formulation EBL-01, SPN-06 Xylenes, n-amyl acetate or MIBK
ZEP 520A-7 + Anisole Thinner formulation EBL-01, SPN-06 Xylenes, n-amyl acetate or MIBK
H-SiQ 6% - MIBK HSQ Equivalent EBL-01, SPN-06 0.24N TMAH or 0.26N TMAH

Other Resists

Name / Datasheet Tone Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
LOR 3A N/A Cyclopentanone, PGME Liftoff, Non-imaging 0.24N TMAH, 0.26N TMAH EBR PG (ethylene glycol, PGME)
PMGI SF 5S N/A Cyclopentanone, PGME Liftoff, Non-imaging 0.24N TMAH, 0.26N TMAH EBR PG (ethylene glycol, PGME)
PMGI SF 2S N/A Cyclopentanone, PGME Liftoff, Non-imaging 0.24N TMAH, 0.26N TMAH EBR PG (ethylene glycol, PGME)
NXR-1025 N/A Stockroom, Nanoimprint

Miscellaneous

These may be available but are not guaranteed to be stocked

Name / Datasheet Tone Composition Use / Thickness Tool Compatibility Developer Remover Alternative Resists
KL5305 + PGMEA General 0.26N TMAH NMP, DMSO S1805
KL5315 + PGMEA General 0.26N TMAH NMP, DMSO S1813
KL6003 + PGMEA 0.26N TMAH NMP, DMSO SPR 220-3, SPR 220-4.5
K-PRO 3 + PGMEA Plating, Etching 0.26N TMAH or alkaline salts NMP, DMSO SPR 220-3, SPR 220-4.5
AZ 12XT-20PL-15 + PGMEA CAR (i-line), Plating, Packaging, Deep Etch AZ300 (0.26N TMAH) SPR 220-7, AZ P4620
AZ P4620 + PGMEA Thick Resist, Plating, Packaging AZ300 (0.26N TMAH) or AZ400K 1:4 (potassium salts) SPR 220-7, AZ 12XT-20PL-15
ma-N 2403 - e-beam/DUV Mix and Match
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