Difference between revisions of "Process Resources"

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(→‎Lithography: Ancillary Process Chemicals)
 
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= General Process Documents=
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* [https://upenn.box.com/s/ol48q2o2pq7it1kn7spai87c9ene9cvs KemLab Resist Presentation]
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= Lithography =
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* [[Resists at QNF]]
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* [[Developers at QNF]] -- Under Construction]
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* [[Ancillary Process Chemicals at QNF]] -- Under Construction
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= Film Characterization=
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* [https://upenn.app.box.com/file/1004242723681 Deposition and Etch Characterization of LPCVD SiNx thin films]
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* [https://upenn.app.box.com/file/1004880785762 ALD deposition of SiO2 using BDEAS and Ozone precursors]
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= Soft Lithography =
 
= Soft Lithography =
 
* [https://upenn.box.com/s/b6e694cf6r5qul32cmsjkbr9oydc6d7o Course Material for the QNF Soft Lithography Workshop]
 
* [https://upenn.box.com/s/b6e694cf6r5qul32cmsjkbr9oydc6d7o Course Material for the QNF Soft Lithography Workshop]
* Training video - Spin coating thick resist [https://www.youtube.com/watch?v=ybFHtd2pPYs Video]
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* [https://upenn.box.com/s/xrlkb6agcqae7ietb16mk5d84zqbcbr0 PDF Presentation for Biological Researchers]
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* [https://upenn.box.com/s/10wkjldwrt3f6it5ted0jo74b72eu0m4 PDF Presentation for ESE 536]
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* Training Videos
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:* [https://www.youtube.com/watch?v=ybFHtd2pPYs Training Video - Spin Coating Thick Resist]
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:* [https://www.youtube.com/watch?v=cRzLljt0VLs Training Video - Use of MA-03, ABM Mask Aligner]
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:* [https://www.youtube.com/watch?v=SCs87pYIn5w Training Video - Negative Resist First Mask Alignment Mark]
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:* [https://www.youtube.com/watch?v=Wzrsv_01ZNE Training Video - Developing SU8 Resist]
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:* [https://www.youtube.com/watch?v=powcV3r4IhM Training Video - Degassing PDMS]

Latest revision as of 15:23, 3 July 2023