Difference between revisions of "Nanonex NX2600 Nanoimprint"
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m (Changed protection level for "Nanonex NX2600 Nanoimprint" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite))) |
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| − | | Staff_Manager = David Barth | + | | Staff_Manager = [[David Barth | David Barth]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = Nanonex | | Tool_Manufacturer = Nanonex | ||
Revision as of 13:48, 3 January 2024
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| Tool Name | Nanonex NX2600 Nanoimprint |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Nanonex |
| Tool Model | NX-2600 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template features into spin-coated resist on a range of substrates. The instrument is capable of thermal embossing (T-NIL) using thermoplastic polymers, as well as UV-assisted embossing (UV-NIL) using UV curable polymers. The NX-2600 utilizes Air Cushion Press (ACP) technology that provides excellent uniformity of the pattern transfer.
Applications
- Thermal nanoimprint lithography
- UV nanoimprint lithography