View source for Nanonex NX2600 Nanoimprint

[[Category:Lithography]]

{{EquipmentInfo
| name = Nanonex NX2600 Nanoimprint
| Tool_Name = Nanonex NX2600 Nanoimprint
| image = [[Image:MA-02.jpeg|300px]]
| imagecaption = 
| Instrument_Type = Deposition
| Staff_Manager = [[David Barth | David Barth]]
| Lab_Location = Bay 2
| Tool_Manufacturer = Nanonex
| Tool_Model = NX-2600
| NEMO_Designation = MA-02
| Lab_Phone = XXXXX
| SOP Link = [https://www.seas.upenn.edu/~nanosop/NX2600_SOP.htm SOP]
}}

== Description ==
The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template features into spin-coated resist on a range of substrates. The instrument is capable of thermal embossing (T-NIL) using thermoplastic polymers, as well as UV-assisted embossing (UV-NIL) using UV curable polymers. The NX-2600 utilizes Air Cushion Press (ACP) technology that provides excellent uniformity of the pattern transfer.

===== Applications =====
* Thermal nanoimprint lithography
* UV nanoimprint lithography 

== Resources ==

===== SOPs & Troubleshooting =====
* [https://www.seas.upenn.edu/~nanosop/NX2600_SOP.htm QNF SOP]