Difference between revisions of "Litho Workstation for BEAMER and TRACER"
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| imagecaption = | | imagecaption = | ||
| Instrument_Type = Lithography | | Instrument_Type = Lithography | ||
| − | | Staff_Manager = David Barth | + | | Staff_Manager = [[David Barth | David Barth]] |
| Lab_Location = Bay 2 | | Lab_Location = Bay 2 | ||
| Tool_Manufacturer = GenIsys | | Tool_Manufacturer = GenIsys | ||
| Tool_Model = BEAMER / TRACER | | Tool_Model = BEAMER / TRACER | ||
| − | | | + | | NEMO_Designation = EBL-02 |
| Lab_Phone = XXXXX | | Lab_Phone = XXXXX | ||
| SOP Link = | | SOP Link = | ||
Latest revision as of 14:10, 3 January 2024
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| Tool Name | GenIsys BEAMER & TRACER Software |
|---|---|
| Instrument Type | Lithography |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | GenIsys |
| Tool Model | BEAMER / TRACER |
| NEMO Designation | EBL-02 |
| Lab Phone | XXXXX |
| SOP Link | |
Description
Pattern data for electron beam (e-beam), mask aligner and laser lithography is prepared using a software packages called BEAMER and TRACER by GenISys. The software package offers advanced data preparation, 2D and 3D proximity effect correction (PEC), process modeling and simulation for direct write applications in both e-beam and laser lithography.
Applications
- E-beam lithography data preparation
- Laser lithography data preparation