Difference between revisions of "Jupiter II RIE Plasma Etcher"

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m (Changed protection level for "Jupiter II RIE Plasma Etcher" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite)))
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| imagecaption =  
 
| imagecaption =  
 
| Instrument_Type = Etch
 
| Instrument_Type = Etch
| Staff_Manager = Sam Azadi
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| Staff_Manager = [[Kyle Keenan | Kyle Keenan]]
 
| Lab_Location = Bay 2
 
| Lab_Location = Bay 2
 
| Tool_Manufacturer = March
 
| Tool_Manufacturer = March
 
| Tool_Model = Jupiter II
 
| Tool_Model = Jupiter II
| Iris_Designation = DE-08
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| NEMO_Designation = DE-08
| Lab_Phone = XXXXX
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| Lab_Phone = 215-898-9748
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/JupiterII.htm SOP]
 
| SOP Link = [https://www.seas.upenn.edu/~nanosop/JupiterII.htm SOP]
 
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Latest revision as of 14:09, 3 January 2024


Jupiter II RIE Plasma Etcher
DE-08.jpeg
Tool Name Jupiter II RIE Plasma Etcher
Instrument Type Etch
Staff Manager Kyle Keenan
Lab Location Bay 2
Tool Manufacturer March
Tool Model Jupiter II
NEMO Designation DE-08
Lab Phone 215-898-9748
SOP Link SOP

Description

The March Jupiter II is a reactive ion etcher configured with O2 gas. The system is typically used as a plasma asher/cleaner.

Applications
  • Removal of photoresist
  • Removal of organic materials


Resources

SOPs & Troubleshooting