File:DE04 PECVD SiO2 rate etch via CHF3O2.png

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Summary

DE04 etch rate for PECVD SiO2 using CHF3 and O2

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current09:45, 18 June 2024Thumbnail for version as of 09:45, 18 June 20242,952 × 2,278 (4.32 MB)Azadi (talk | contribs)DE04 etch rate for PECVD SiO2 using CHF3 and O2

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