Cu master recipe

Return to PVD-05

Step T004 is the deposition step and step T005 is the cool-down step (300 s).

Step Number	T000	T001	T002	T003	T004	T005	T006
Step Time (sec)	5	120	60	60	[dep]	300	5
Min Vacuum Setpoint (Torr)
Gas - (PID or Fixed)		PID	PID	PID	PID
Gas - PID Master Gas Select		1	1	1	1
Gas1 - Setpoint (sccm)		10	10	10	10
Gas2 - Setpoint (sccm)
Gas PID Pressure (mTorr)		10	5	3	3
RF Source - Sputter (Watts)
RF Source - Cathode Select
RF Source - Shutter
DC 1 Source - Sputter (Watts)
DC 1 Source - Cathode Select
DC 1 Source - Shutter
DC 2 Source - Sputter (Watts)		100	200	300	400
DC 2 Source - Shutter					Open
Pressure Control (Throttle)		Yes	Yes	Yes	Yes
Ignition Pressure (mTorr)
Rotation Speed (0-100%)		50	50	50	50	50
End Process (Yes)							Yes