Nanonex NX2600 Nanoimprint
Revision as of 12:32, 2 May 2022 by Dsbarth (talk | contribs) (Changed protection level for "Nanonex NX2600 Nanoimprint" ([Edit=Allow only autoconfirmed users] (indefinite) [Move=Allow only autoconfirmed users] (indefinite)))
 |
|
| Tool Name | Nanonex NX2600 Nanoimprint |
|---|---|
| Instrument Type | Deposition |
| Staff Manager | David Barth |
| Lab Location | Bay 2 |
| Tool Manufacturer | Nanonex |
| Tool Model | NX-2600 |
| NEMO Designation | {{{NEMO_Designation}}} |
| Lab Phone | XXXXX |
| SOP Link | SOP |
Description
The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template features into spin-coated resist on a range of substrates. The instrument is capable of thermal embossing (T-NIL) using thermoplastic polymers, as well as UV-assisted embossing (UV-NIL) using UV curable polymers. The NX-2600 utilizes Air Cushion Press (ACP) technology that provides excellent uniformity of the pattern transfer.
Applications
- Thermal nanoimprint lithography
- UV nanoimprint lithography